Used NIKON NSR SF120 #293818225 for sale

NIKON NSR SF120
Manufacturer
NIKON
Model
NSR SF120
ID: 293818225
i-Line stepper.
NIKON NSR SF120 is a semi-automated wafer stepper designed for photomask making, direct write semiconductor lithography, and other industrial applications. The SF120 features an ultra-high resolution, a minimum of 0.28 nm, to enable the production of highly complex patterns with optimal accuracy. The machine has an advanced, fully programmable wafer table designed to accommodate the miniaturization of devices and accommodate more intricate shapes and sizes. It is fitted with a 200 mm wafer flipper, allowing wafer loading and unloading without manual intervention. Additionally, the machine comes with a NIKON High NA lens (NA 0.7) to allow printing with maximum focus accuracy for best-in-class resolution and imaging. In terms of design, NIKON NSR-SF120 has a two-stage optical system, designed to reduce distortion and improve pattern fidelity. The stepper also has advanced alignment capabilities that enable the user to accurately and quickly identify and resolve alignment errors, which in turn helps improve throughput. The machine also features high-accuracy auto-focus capabilities and has a high-speed stepper shutter specifically designed to reduce settling time and achieve faster exposure time. NSR SF 120 is also highly reliable, as it includes advanced safety measures, such as a load-lock chamber, that protect the operator and the device from high-pressure exposure. The machine also has an intuitive graphical user interface that allows the user to manage and monitor machine operations. The stepper is equipped with two piezo-electric based operations, allowing users to increase throughput and repeatability. It also has an embedded image processor, which helps to provide real-time feedback and improve image quality. In summary, NSR-SF120 is a semi-automated wafer stepper designed for photomask making, direct ex semiconductor lithography, and other industrial applications. It has a minimum resolution of 0.28 nm, advanced alignment capabilities, high-accuracy auto-focus capabilities, and a high-speed stepper shutter. Additionally, the machine is highly reliable, as it includes advanced safety measures and a load-lock chamber, and it has an intuitive graphical user interface. Two piezo-electric based operations help increase throughput and repeatability, and the embedded image processor helps provide real-time feedback and image quality.
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