Used NIKON NSR SF120 #9247819 for sale

NIKON NSR SF120 is an ultra-high precision full-field wafer stepper equipment designed for integrated circuit fabrication. It is designed to fabricate circuit elements with a precision of 1.2-micron (at 100-KeV). The system adopts a telecentric illumination scheme that is common to NIKON family of lithography systems, and provides projection of halftone patterns over the entire surface of polished wafers. NIKON NSR-SF120 unit is designed to enable high throughput processing of wafers with a single exposure machine, with a throughput of 250 wafers per hour. The tool consists of a high-performance motion asset with linear optical fields, a high-accuracy imaging lens, an efficient light source, and a model controller. The wafer stage is designed to provide accurate, repeatable motion of polished wafers, which is critical for achieving high throughput. The wafer stage includes frictionless linear motors which are capable of accurately positioning the wafer in both X and Y axes. The imaging lens in NSR SF 120 equipment is optimized for imaging elements smaller than 1.2-microns. Key components of the imaging system are off-axis and asymmetric-off-axis parabolic mirrors that minimize aberrations in the imaging unit. The light source is a KrF excimer laser with a wavelength of 248nm, which provides superior performance for imaging small structures on polished wafers. The machine controller provides precise control of the imaging optics as well as the wafer motion tool. NSR SF120 asset can be configured with additional options which further enhance its performance. These include high-resolution optics for imaging extremely small structures, and specialized wafer stages for processing large wafer sizes. The model also offers an adjustable cleaning equipment which further increases its precision and improves process turnaround time. In summary, NIKON NSR SF 120 wafer stepper system is designed for ultra-high precision integrated circuit fabrication. It features advanced optics and wafer motion systems, as well as a KrF excimer laser which provides the necessary light source. In addition, customers can configure their systems with additional options for further improved performance.