Used NIKON NSR SF120 #9251800 for sale

NIKON NSR SF120
Manufacturer
NIKON
Model
NSR SF120
ID: 9251800
Wafer Size: 12"
Vintage: 2003
i-Line stepper, 12" 2003 vintage.
NIKON NSR SF120 is a high performance, high accuracy and highly reliable wafer stepper. It is designed for both production and development use in fabs for a wide range of applications such as microfabrication, lithography, and optical patterning. Equipped with a single-stage stepper equipment, NIKON NSR-SF120 provides superior alignment accuracy, high throughput, and a wide range of exposure options. NSR SF 120 offers a wafer stage capable of supporting up to 6" diameter wafers. The wafer stage features an outer frame with a rigid aluminum structure and a high-precision differential air-bearing stage. Its design allows for precise stage motion in the XY and Z axes, enabling it to provide a maximum throughput of up to 5 wafer/s and achieving a high level of alignment accuracy (±0.5 µm). The stage is also provided with a fully-automated alignment system. NSR SF120 is equipped with a 300mm lens canister, which is optimized for a variety of NIKON optics, offering a wide range of fields of view and numerical apertures. The unit is also provided with a full-featured high-precision alignment machine allowing flexible and accurate positioning of the optical components. The 150W mercury lamp provides a wide range of exposure energies, allowing a broad range of exposure settings depending on the application. The short wavelength of the halogen light source enables NIKON NSR SF 120 to achieve a resolution of 1 µm. NSR-SF120 is provided with a comprehensive control interface allowing for tool automation and easy integration into a production environment. Its user-friendly touchscreen interface allows one to set up the asset and to adjust parameters in no time. In addition, NIKON NSR SF120 complies with pertinent safety regulations and is provided with a user-friendly safety model making the operation of the equipment safe and efficient. Therefore, NIKON NSR-SF120 is an ideal choice for achieving efficient, precise wafer exposure.
There are no reviews yet