Used NIKON NSR SF120 #9310946 for sale
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ID: 9310946
Wafer Size: 12"
Vintage: 2003
i-Line stepper, 12"
SMIF Type: OHT
WL In-line (FOUP: Front In-line)
Signal tower: (3) Colors
Right and left chamber
Temperature controller
Lamp cooling unit
Back side frame
(2) Lamp houses / Loader rails
Top chamber
Control panel
(3) Boxes
Automation online component: SECE
Aperture INA: 0.45
Focus system: Multi focus
Leveling system: Table
Main body:
Magnification: 1/4 Reduction
Light source: 365 nm
Resolution: 0.28 µm
Variable lens: 0.50 to 0.62 nA
Exposure filed size: 25 x 33 mm
Lens adjustment:
(5) PIEZO: 3 Axis
Lens cloudiness: Lemon skin filter
PC System hardware:
Type: DS10
Y2K Completion
No UPS system
Reticle size, 6"
Variable reticle microscope
Alignment sensor:
LSA
FIA
AIS
No LIA
Illumination interferometer system:
Mercury ARC lamp: 5 kW
Wafer stage
Reticle stage
Wafer loader, 12"
Type 3
Port number: 1
Notch type
Hold type: Ping type
Cassette
Front in-line (EFEM)
Pre-align type: NC PRE2
No edge exposure
Reticle loader:
SMIF Type (OHT)
Library / Slot: (2) Indexes
Barder reader
Particle checker: PPD2
Library: Center
Control rack:
Type: Right
Cable length: Normal
s52 Chamber:
Type: Sendai chamber
Single
BATC / CATC / LLTC: 23°
Power supply: 208 V, 60 Hz, 3 Phase
Missing parts:
(4) ALG-AF Control PCB
FIA-AF Control PCB
2003 vintage.
NIKON NSR SF120 is a wafer stepper designed for advanced photomask fabrication of small, high resolution devices. It is used for nano-imaging and is capable of creating high-quality photomasks with less resist, defect level, and high throughput. NIKON NSR-SF120 features a Stepper Optics Equipment (SOS) with a 4" (100mm) mask field size for high resolution imaging that is suitable for single to 5-layer masks. The optics also includes 6-axis alignment with a 0.1 um accuracy and 0.02 um resolution for nano-scale imaging. Additionally, the wafer stepper features an alignment system that utilizes a 1.4 megapixel resolution CCD camera for automated wafer movement detection, as well as a 3-axis vibration detection unit that can detect low level vibrations from the environment for additional optical stability. The wafer stepper also includes a Complete Process Control Machine (CPCS) that utilizes a state-of-the-art calculation algorithm for high throughput optimization. The CPCS allows users to monitor and adjust the exposure process in real-time for optimal mask fabrication. In addition, NSR SF 120 includes an AVI (AutoVision Interface) sub-tool for reliable and efficient photomask pattern patterning. The AVI offers improved pattern transfer accuracy and automation through advanced optical topography and geometry measurement techniques. The wafer stepper also offers an extended PC controlled wafer manipulation interface that allows users to quickly setup, check or adjust the wafer position. In terms of reliability, NIKON NSR SF 120 is designed to be highly resilient and durable with its advanced cooling asset and robust mechanical and environmental protection features. The wafer stepper also allows users to easily switch between different substrates due to its automated wafer alignment and exchange feature. The stepper has a quick wafer loading time of 60 seconds and a processing time of 90 seconds for a 4" (100mm) mask field size. Finally, NSR-SF120 comes with user friendly maintenance features and customizable action buttons for optimal performance.
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