Used NIKON NSR SF130 #293603896 for sale

Manufacturer
NIKON
Model
NSR SF130
ID: 293603896
i-Line stepper EFEM Projection lens Illumination unit Interferometer laser (Wafer stage) Interferometer laser (Reticle stage) Control rack Temperature unit Operation unit Pneumatic control box RL-LIB10MP Board 6-Axis vibration measurement unit Wafer holder Chemical filter Wafer reticle Lamp house cool unit Power supply box Illumination power uniformity: Power: 619.474 mw / cm² Uniformity: 2.229% Stepping accuracy step: X: 10 Y: 13 Stepping accuracy back: X: 9 Y: 11 Inclination: TFD: 0.068 AS: 0.029.
NIKON NSR SF130 is a deep ultraviolet (DUV) wafer stepper with a high-resolution lens and adjustable illumination level, ideal for advanced lithographic processes and applications. The equipment is capable of achieving extremely high resolutions, down to 13nm feature size. This level of resolution is often necessary for advanced processor node lithography, as well as other advanced applications in the semiconductor industry. NIKON NSR-SF130 stepper has a number of features designed to improve performance. It is equipped with NIKON Enhanced OSA, which can automatically detect features on the wafer's surface to help optimize exposure settings. The system also features an arc-shaped window that compensates for positional errors that can occur during motion of the wafer while exposing. Additionally, NSR SF 130 has a four port optical scanning module to facilitate multi-beam scanning capabilities. In terms of resolution, NSR-SF130 is capable of producing 13 nm images through its advanced two-phase, four-stage lens unit. It can also generate exposure fields up to 300 x 400 mm in area, and at speed of up to 480 wafers per hour. As a result, the machine comes with a variety of options to suit a variety of challenging lithographic applications. NSR SF130 is also highly configurable, with a large selection of exposure wavelengths, illumination levels, exposure fields, and programmable wafer transfer systems. It utilizes a high-resolution CCD imaging tool that can provide exposure feedback quickly, enabling the asset to make necessary adjustments in real-time. Finally, NIKON NSR SF 130 model is designed to be extremely user-friendly, with simple graphics and easy-to-use operations. The intuitive interface can be used to enter data, adjust exposure settings, and review exposure results. The equipment also comes with a number of advanced software features, such as exposure monitoring, defect review, and process mapping. All of these features are designed to streamline the lithography process and make it easier for operators to maintain efficiency and accuracy.
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