Used NIKON NSR SF130 #9222618 for sale

NIKON NSR SF130 is a sophisticated wafer stepper tool engineered to provide precision wafer processing capabilities. This sophisticated stepper supports a variety of key functions including focus alignment, overlay alignment and exposure exposure. NIKON NSR-SF130 employs stepper technology that provides superior accuracy and repeatability for a wide variety of wafer processing applications. The accuracy of the exposure control and focusing is achieved through an Auto-Steering 2-axis stage that is capable of accurately positioning the wafer to within nanometers of the desired location. The built-in alignment equipment utilizes a pattern recognition structure to accurately align the patterned areas of the wafer even when exposure targets are placed very close together. The SF130 is capable of achieving a high level of throughput due to its advanced exposure system. The exposure unit features two independent sources that ensure uniform exposure across the wafer. This multi-source machine supports a wide variety of wavelengths and illumination types including time-shared, multiple beams, single coupler and quad CMOS exposure techniques. The exposure tool is further enhanced with dual simultaneous exposure capability which enables doubled the output with half the cycle time. NSR SF 130 wafer stepper also features an integrated XY-dependent Auto-Focus asset providing prestigiously fine focus control. The Auto-Focus model uses a proprietary algorithm which combines edge-detection and gradient-based techniques to automatically determine the optimal exposure focus. This equipment also includes an innovative active out-of-focus control that further optimizes the auto-focus performance and compensates for minor offsets from the desired exposure focus. NIKON NSR SF 130 is a cutting edge wafer stepper tool that offers superior accuracy, repeatability and throughput for wafer processing. This tool provides a powerful and reliable solution for semiconductor lithography applications that require high levels of precision and reproducibility. The versatile exposure system, integrated auto-focus unit, and advanced alignment capabilities make the SF130 a superior choice for demanding processes.