Used NIKON NSR SF130 #9311380 for sale

NIKON NSR SF130
Manufacturer
NIKON
Model
NSR SF130
ID: 9311380
Wafer Size: 12"
Vintage: 2004
i-Line steppers, 12" 2004 vintage.
NIKON NSR SF130 Wafer Stepper is an advanced lithography equipment designed to support semiconductor production. This system provides an advanced optical imaging unit using precision stage motion to create high resolution features on the semiconductor wafer. NIKON NSR-SF130 is a 6-inch lithography machine designed with an advanced imaging tool featuring a reduction projection lens with an NA of 0.25 and high numerical aperture lenses of up to 0.6. The asset uses a dynamic stage module to support large stage movement of up to 1mm. This allows the model to maintain a focus throughout the extensive motion range. The image plane, slit and focus detections are enabled by a built-in high accuracy laser interferometer for efficient wafer positioning and lithography. The equipment offers a standard pellicle loader and masking system to ensure task-specific accuracy when handling and shimming the masks. NSR SF 130 is powered by an advanced control unit featuring an intuitive NC computer unit with advanced intelligence and integrated NC applications. The machine includes auto-alignment and auto-focus functions that allow for precise patterning and accurate registration. Additionally, the tool supports auto-frame correction for better mask positioning. The asset supports multiple exposure techniques including 0.5-8um, deep UV, deep X-ray, visible, and various advanced techniques. The resolution range is 0.1um or better and the maximum wafer size of 6-inch allows for fast production. Additionally, the model provides advance process matching to ensure a consistent lithography pattern at every stage. NSR-SF130 Wafer Stepper provides a reliable and efficient basis for semiconductor production. Its advanced imaging equipment and precise control provide users with high resolution lithography with superior accuracy and speed. Its multiple exposure techniques and support for various advanced lithography techniques make it an ideal choice for medium to high volume semiconductor production facilities.
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