Used NIKON NSR SF140 #293630225 for sale

NIKON NSR SF140 is a variable field, lithography scanner with a wide application range, allowing for high throughput and cost effectiveness. It is a 5-axis wafer stepper designed to deliver exceptional pattern quality from the most challenging mask layouts through a combination of highly precise motion, flat fielding, and novel imaging optics. Its Intelligent Illumination Control (IIC) maintains constant exposure parameters no matter what the feature size, layout, or field of view. The SF140 offers wide field of view and large scan range compatibility, with a field width of up to 1 meter and 150 mm field height. The SF140 also delivers very fast wafer throughput and high throughput tool loading due to its automated alignment and scanning capability. It supports backside exposure and non-uniformity of field to further increase the chip area executed in one scan. With its load and count index (L&CI) for wafer loading and handling, it is possible to quickly reload different wafers onto the stepper, reducing time and increasing throughput. The SF140 also offers excellent image uniformity, as its advanced optics provide high depth of focus and low distortion over its entire field of view. It is also equipped with advanced Image Processing algorithms for distortion calibration, aberration correction, and edge erosion compensation. Its high resolution imaging and focusing structure work in tandem, with controllable scanning pitch and optical focus, allowing for extremely fine patterns and defect free overlay, with repeatable results. The SF140's voice coil motor based design offers ultra-fast acceleration, high accuracy, and no mechanical play. It also allows for simultaneous multi-axis alignment and scanning (roll-welding). It is also well-suited for double patterning techniques, due to its small illumination spot size and fast response time. Other features include an anti-electron space charge manipulator, anti-electron reflection focused ion beam, and a Laser Alignment system, all of which are important for wafer exposure. The SF140 also has an in-chamber beam-environment management system, allowing for stable and low distortion imaging conditions, even in less than ideal environments. The robotic wafer handling capability of the SF140 offers quick and easy handling of up to 50 wafers, further increasing throughput. Overall, NIKON NSR-SF140 delivers an impressive combination of precision motion, imaging optics, and advanced software, resulting in high throughput, advanced pattern capabilities, and excellent overlay accuracy.