Used NIKON NSR SF200 #293597490 for sale

NIKON NSR SF200 is a wafer stepper designed to be highly efficient in assembly and manufacture of semiconductor devices. It is engineered to be one of the most advanced wafer steppers on the market today. Its single-stage reduction architecture speeds up wafer processing, ensuring high throughput and superior performance. NIKON NSR SF 200 features a 125mm diameter substrate stage, the largest available on a single-stage reduction machine. This allows for the exposure of high-density patterns with superior overlay accuracy. The Photon is modeled after NIKON Double-Stage Reduction (DSR) machine and is equipped with the ability to process non-planar surfaces. The CFM248 exposure head is equipped with 200W halogen bulbs, providing low-cost illumination for wafer applications. NSR SF200 wafer stepper provides superior pattern accuracy and resolution up to 22 nm with FWD Type 1 lenses. It is equipped with a seven-axis auto-tuning feature which adjusts exposure settings, allowing for faster and more precise patterning performance. The speed of its stage motion can reach up to 800mm/sec with a maximum exposure of 1.2 kV and total transmission of 100%. NSR SF 200 is designed with a number of other features making it a standout among wafer steppers. It is incorporated with advanced foucs-exposure control (FEC) and fast multi-pass overlay adjustment for an efficient manufacturing process. The wafer stepper also boasts small size, low electric power consumption, and robust durability with its sinterless, modular design. NIKON NSR SF200 is further equipped with an image recognition system for repeatable accuracy time after time. It runs on NIKON Synoptics Operating System and comes complete with a range of available software such as HPFocalOne. This easy-to-use software package allows for active monitoring, data management and analysis of pattern alignment and overlay during exposure. NIKON NSR SF 200 is a versatile, technologically advanced wafer stepper designed to help streamline semiconductor production. It is the ideal solution for both high-volume and low-volume wafer applications and delivers superior quality and accuracy every time.