Used NIKON NSR TFH EX14C #9276258 for sale

NIKON NSR TFH EX14C, is a state-of-the-art deep-UV wafer stepper designed for high productivity. Equipped with a high-power RI (Reflection Index) Source (up to 350W@248nm), NIKON NSR TFHEX14C provides outstanding lithographic performance in sophistication and repeatability. NSR TFH EX14C is equipped with an advanced 4-quadrant auto alignment equipment that confirms the X-Y positioning of wafers and aligns on-the-fly to achieve highly accurate alignment of wafers. Additionally, the full automation systems aids in drastically reducing human errors, enabling NSR TFHEX14C to expose at a rapid rate. NIKON NSR TFH EX14C is equipped with an advanced imaging system at its focal plane which compensates for the aberration of the projection lens and maintains diffraction image accuracy at ±3µm. It is capable of 7nm resolution and 0.1µm accuracy in generating fine patterns of the device. NIKON NSR TFHEX14C's Reflex Source Unit improves image exposure uniformity by directing the light source towards the wafer with appropriate light dispersion. The Reflex Source Machine has superior characteristics such the ability to reduce shot-to-shot variation, and also significantly reduces layout clustering. The advanced high NA optics reduce exposure time from 2 to 10 times compared to high NA optics, offering much shorter exposure times. It delivers superior imaging performance with a depth of-field improved by 20%, as well as improved at-source focus capability that reproduces defocused patterns accurately. The advanced PCB (Process Control Board) of NSR TFH EX14C enhances the throughput and generality of the exposure tool. It also incorporates an intuitive and easy-to-use graphic user interface, with user-friendly navigation and management functions enables operators to efficiently monitor and control multiple processes. Finally, NSR TFHEX14C is equipped with a mass source asset which offers excellent source power management capability which prevents any potential source power problems. This translates to highly stable exposure performance. NIKON NSR TFH EX14C is the ideal wafer stepper for large volume exposure wafer lithography. It has been designed to offer high productivity and superior lithographic performance while drastically reducing human errors.