Used NIKON NSR TFH i12 #9197998 for sale
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ID: 9197998
Wafer Size: 6"
Vintage: 1998
Photolithography stepper, 6"
SEIKOSHA BP-4500 Computer controller
VIEWSONIC Flat screen monitor
Keyboard
Mouse
Control cabinet
Wafer loader: Type 2 left inline
Reticle loader: (13) Slots single library
Inline: Left type
Wafer loader:
WL-12 v2.30 13V4.50
OF-12 v2.30 B4V3.20
WR-12 v2.50
WLY-11 v1.30 10V2.11
Lens controller: 71V6.80
Main computer: NIKON NEST V
VAX Station: 4000.96
Tape driver: DAT40
Chamber type: SENDAI S19
Chamber temperature: 20.0
IATC Temperature: 20.1
LLTC Temperature: 20.32
Compressed air (at 50 liter/min flow): 3.1kg/cm2
Vacuum pressure (at 50 liter/min flow): -600mmhg
Process cooling water flow rate (at 20°C): 35 liter/min
LLTC Coolant flow rate:
Atmospheric pressure: 835.78 Hpa
Refrigerator pressure:
Set point:
High: 1.3~1.5 (actual 1.4)
Low: 0.35~0.55 (actual reading 0.38
1998 vintage.
NIKON NSR TFH i12 is a state-of-the-art wafer stepper developed by NIKON to help guide the fabrication of semiconductor devices. The wafer stepper is designed for high precision and high productivity lithography applications in the semiconductor industry. Its combination of high resolution, high throughput, and compatibility with high-aspect-ratio lithography targets makes it ideal for a variety of device fabrication processes. NIKON NSR-TFHI12 has two operation modes of Scanning and Step and Repeat. In Scanning mode, a reticle containing a pattern is scanned across the surface of a wafer in turn. The pattern is exposed on the wafer with each pass of the scanner. In Step and Repeat mode, a single image is imaged on many portions of the wafer. The wafer is then moved between exposures so that the successive exposures are all related by predetermined magnification and base to base displacement. In order to maximize performance, NSR TFH i12 is equipped with a variety of advanced features. One key feature is a wafer autoloading system which is designed to reduce misalignment and misfeasance of the wafer. The stepper also has a variety of alignment options including high precision, high accuracy stage searching, inline scanning, or on-the-fly reticle positioning to ensure top notch accuracy and throughput. In addition, it also offers an auto-focus and Astigmatism correction to achieve the best focus and image uniformity. NSR-TFHI12's integrated environment allows fast and accurate process control on each wafer, feature by feature. It is capable of a variety of exposure techniques such as focusing optimization, advanced defect review, and technology recipe-driven recipes. The stepper also encompasses a digital microscope to enable operators to inspect the pattern of each reticle with high magnification and resolution. Finally, NIKON NSR TFH i12 is designed for real time production and meets the challenge of being cost effective, yet highly efficient. It can also be easily integrated into an existing production environment, saving time and enabling seamless production. All in all, NIKON NSR-TFHI12 is an excellent choice for cost effective wafer stepper solution.
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