Used NIKON NSR-TFH i14 DL #9023488 for sale
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ID: 9023488
i-Line stepper, 6"
Body: i14
Wafer thickness: 1.2mm
Wafer type: Notch
Loader type: 3
Controller: VAX
GEM: Yes
Numerical aperture: 0.3-0.45
Lens data:
Distortion spec +/- 40nm
TFD spec 0.5um
AST spec 0.4um
Curvature spec 0.4um
-Pre data collection before lens optimization.
-Distortion ID1
Max vector X= 65nm, Y=51nm
Min vector X= -87nm, Y= -60nm
Reduction= 0.823
- INC ID1
TFD = 0.726
AST= 0.359
Curvature= -0.251
-Distortion ID9 (map is similar to ID1)
Max vector X= 67nm, Y=65nm
Min vector X= -69nm, Y= -57nm
Reduction= -0.742
Post data after lens optimization:
-INC ID1
TFD = 0.403
AST= 0.240
Curvature= 0.028
-Distortion ID1
Max vector X= 0.024nm, Y= 0.025nm
Min vector X= -0.043nm, Y= -0.042nm
Reduction= -0.323
-Distortion ID9
Max vector X= 43nm, Y= 32nm
Min vector X= -37nm, Y= -34nm
Reduction= 0.270
Main body is not crated
FC77 oil is in the chem support
Accessories included
Deinstalled by OEM
No lens data were collected prior to deinstall
Currently crated.
NIKON NSR-TFH i14 DL is a wafer stepper that is designed to perform lithography processes for semiconductor device fabrication. It is built to provide high-precision lithography processes with industry-leading precision and accuracy. NIKON NSR TFH I14DL is equipped with several advanced features that help to deliver superior lithography results. Its design includes an advanced reticle stage with a 4-axis stepped variation scan and auto-leveling capabilities, allowing for fast and reliable operation. It also includes a high-grade imaging field flattening lens for improved light uniformity across the imaging field. The integrated backside alignment system ensures accurate wafer alignment and overlay accuracy. NSR-TFH i14 DL can expose images of up to 4 micrometers with excellent resolution capabilities. The results are highly accurate with excellent depth of focus. The advanced optics and illumination system make this wafer stepper effective in aligning even the smallest structures on complex substrates. Its proprietary Deep Ultraviolet (DUV) capability allows it to expose images even with the most challenging features, giving a sharp image with superior contrast. The robust construction of NSR TFH I14DL allows for an extended lifetime of operation without underlying or peripheral performance degradation. Built with its own RPC modeling language and complex software interface, the wafer stepper offers great flexibility and can be customized according to different processing requirements. NIKON NSR-TFH i14 DL helps to reduce cycle times and meet tight turnaround times even with complex lithography processes. Providing an even and accurate beam profile and beam power, it enables superior process uniformity with short wafer processing time. Its outstanding hardware and software features help to provide lower cost of ownership while enabling the use of highest quality substrates. Overall, NIKON NSR TFH I14DL is a powerful and reliable wafer stepper designed for device fabrication. Its advanced optics, reticle stage, and illumination systems enable excellent visuals and high-quality lithography results. Built with its own RPC modeling language and complex software interface, the wafer stepper is easy to configure and customize to fit specific application requirements.
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