Used NIKON NSR #293819949 for sale

NIKON NSR is a wafer stepper recognized for its superior performance in meeting the demands of a wide variety of photomask and reticle production and repair requirements. The unit features industry-leading high numeric aperture (NA) lenses which enable enhanced resolution, contrast sensitivity, and throughput. Additionally, NSR is equipped with a simple, user-friendly console for intuitive operation and offers a wide range of field sizes and exposure settings to complete virtually any reticle application. In a typical application, NIKON NSR operates using the 4-step scan reticle imaging process. This includes a reticle preparation station, optical microscope alignment station, exposure station and post-exposure inspection station. The preparation station is used for cleaning, coating, aligning and inspecting the reticle. The alignment station consists of a lens system to image the reticle, as well as an automated alignment system for finding the best exposure field and locations. The exposure station is used to accurately position and expose the wafer onto the reticle, with dynamic focus control for the best possible uniformity. Finally, a post-exposure inspection station is used for a quick on-site inspection of the exposed wafer to confirm the process quality. NSR wafer stepper also incorporates various technologies for exposure accuracy and repeatability, such as a unique High-NA Optics Configuration, modulated depth of focus (MOD) technologies, and three-dimensional (3D) registration for excellent combination of both surface area accuracy and lateral feature overlay. MOD technologies also enable improved resolution and throughput performance capabilities. Additionally, NIKON NSR features several options for advanced control, including process-dependent variable exposure dose control, as well as substrate ID auto-recognition. These features result in a superior production-grade reticle process, providing practitioners with industry-leading precision and accuracy. NSR wafer stepper is ideal for semiconductor device manufacturers needing enhanced resolution, improved pattern contrast and more uniform patterning over a larger field of view. This results in improved yields and better performance of the device. All components work together in a unified system, providing excellent performance, yield, and production efficiency.