Used NIKON PL-2 #293657667 for sale

NIKON PL-2 is a highly advanced lithography stepper developed by NIKON that is equipped with leading-edge technologies for cutting-edge microfabrication process design and implementation. The stepper can be used for various complex lithographic processes thanks to its advanced equipment configurations. PL-2 is designed for precision imaging and has unique characteristics such as the Dual Triple Scan motion system and low aberration optics to address challenging requirements for critical-dimension (CD) tightness tolerance. The Dual Triple Scan provides a two-step scan motion unit for accurate positioning of circuit patterns, which enable multiple, standalone devices to be created with consistent exposure quality. The stepper also has a direct imaging projection machine which enables the placement of photomask patterns onto silicon wafers using high-energy pulsed light. This feature enables the stepper to produce highly detailed line and space patterns which are necessary for device designs. To support such fine structuring, NIKON PL-2 also provides an advanced 300-kW high-power laser source. PL-2 is designed for performance and precision. Its motor tool and low-noise drive design enable smooth acceleration and deceleration, resulting in stable and accurate pattern manipulation. In addition, its precision, low-heat generation bearing design provides quieter operation, improved precision, and reduced contamination due to emission of particles. NIKON PL-2 is also equipped with a highly efficient dust-collection asset. To prevent contamination of sensitive silicon surfaces, it is designed to efficiently capture contaminating particles and offer users superior contamination control. PL-2's advanced processor and software enable users to experience a fully automated process without sacrificing accuracy or performance. The stepper has an intuitive user friendly interface which expands usability to a wider audience. NIKON PL-2 is a powerful wafer stepper with an advanced internal model architecture, efficient operation modes, and superior performance. Its precise, low-particle emission, low-heat bearing design allows for stable and accurate pattern manipulation. Through the Dual Triple Scan motion equipment and powerful laser source, users can achieve high-resolution circuitry with tight CD installations.