Used NIKON PL-2 #293659411 for sale
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NIKON PL-2 wafer stepper is an 8- inch wafer alignment stepper that is used for printing microcircuits onto semiconductor wafers. It provides the highest level of alignment accuracy and unsurpassed image quality for superior device fabrication. PL-2 employs advanced optical engineering technologies to achieve its high-grade imaging, providing focused and uniformly illuminated images in a variety of background colors and levels. Its precision engineering ensures a high-throughput process by minimizing wafer spoiling during stepper operations. The award-winning NIKON PL-2 wafer stepper is equipped with a Double Swing Arm Mounting Method (DSAM) for higher repeatability of alignment accuracy and increased throughput in production. The DSAM system comprises an ergonomic overhead arm with superior component accuracy and a precision-engineered base-level arm with adjustable joints. It utilizes a combination of precise three-axis motion control, high-resolution optical imaging, and automated alignment of the wafer chips for highly accurate overlay alignment operations. PL-2 wafer stepper uses a Reflex Alignment System (RAS) for fast, precise, and easily operated wafer alignment. It features an intra-wafer robot for further improvement of stepper performance, and a direct-drive robotic actuator to move the wafer across the field of view for full-field scan and alignment. The RAS also provides excellent results for double exposures, enabling direct overlay precision of up to ±3μm for critical process layers. NIKON PL-2 wafer stepper is capable of fabricating transistor and capacitor-level devices in fine-line imaging applications. It supports both high-speed and high-precision jobs, with resolutions up to 0.25μm and feature sizes down to 6μm. It also provides a wide range of exposure wavelength columns, from ultraviolet to long wave infrared, to accommodate different wavelength applications. PL-2 wafer stepper offers advanced monitoring capabilities with an on-screen process control feature that allows users to view real-time process status and performance data. The system also provides long-term maintenance and reliability with a range of preventive maintenance programs. Furthermore, its environmental design features a dust-free chamber and a minimal footprint for effective use in tight spaces.
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