Used NIKON R2205HA #293664649 for sale

NIKON R2205HA is a wafer stepper. It is a full field stepper equipment utilizing F2 laser and Synchronous Scanning System (SSS) technology to provide superior imaging control and accuracy. This unit is designed for optically based lithography in semiconductor production applications such as logic, memory and especially fine line devices. It offers a wide range of optical alignment and focusing capabilities to ensure the highest fidelity of devices being produced. R2205HA stepper uses a dual script scan machine to allow for precise control of the exposure process. This tool is designed to precisely control the exposure process through the combination of pattern data modulation, timing, and area scanning. This enable the stepper to have the capability to produce a very precise focus, resolution and overlay parameters for each device being produced. NIKON R2205HA has a 25 nanometer resolution with a 5"x7" field of view. It can pattern millions of features in a single exposure, with a shot time as fast as 0.075 seconds. It also has an extremely consistent exposure accuracy down to tenths of nanometers. The stepper is compatible with silicon wafers, glass plates, quartz substrates and other materials. In addition, R2205HA also features an advanced flexibly enhanced high speed scanning (FEHS) asset. This model provides a uniquely controlled laser source for the equipment. This reduced laser beam size and spot size translates to a higher speed of delivery when it comes to exposing features. NIKON R2205HA also comes with a variety of software features. For instance, it features an integrated Math Precision Tool (MPT) system for performing on-the-fly calculation and optimization of exposure parameters. It can also generate a library of exposures to be stored and recalled for easy processing. This stepper also comes with numerous precision automated alignment features, such as edge fitting, registration zooms and defocus scans. Overall, R2205HA wafer stepper is a sophisticated unit capable of producing superior image fidelity and accuracy. Its numerous features provide users with the utmost in lithography control and precision. The machine is designed for use in any lithography application requiring the highest levels of control and accuracy. Compatible with a variety of materials, it is a perfect option for the most advanced of semiconductor production processes.