Used OBDUCAT NIL-60-SS-UV-VC #9180829 for sale

OBDUCAT NIL-60-SS-UV-VC is a highly advanced wafer stepper for high precision lithography applications. It is designed to provide superior results in a range of UV exposure applications. It is an automated machine-based stepper with a state-of-the-art user-controlled logic system. NIL-60-SS-UV-VC consists of a main body enclosure housing the machine's components and an integrated touchscreen interface. It includes a motorized stepper, a mechanical device for controlling the relative position of two components. It is designed for precise and repeatable performance, with the ability to control the speed, direction, and amount of steps to achieve optimal results. The stepper can be matched to the application, determining the speed, acceleration, linearity, backlash, and precision required. The wafer on which the exposure is performed is placed on a closed loop-controlled table platform, ensuring accurate position control and stable motion control. The platform has a manual wafer lock, as well as a force feedback mechanism for better accuracy. The table is also designed for small and normal wafer loading. The exposure laser is mounted on OBDUCAT NIL-60-SS-UV-VC, while additional laser sources can be added if needed. NIL-60-SS-UV-VC also has multiple safety features, including emergency stop buttons and door interlock, UV light curtain, laser blankers, vibration isolation system, recirculating water cooling, and an ionizer. It also features cold temperature control, adjustable lighting sources, a sensor to detect foreign material on the stage, and an audible and visual alarm. OBDUCAT NIL-60-SS-UV-VC is compatible with OBDUCAT TAIM software, allowing for remote operation of the machine. It is capable of shutting itself down in case of an alarm or any other malfunction. The TAIM software is also capable of storing data, as well as remote monitoring for troubleshooting, data logging, and real-time analysis. NIL-60-SS-UV-VC can be used to perform a wide range of lithography applications, including UV, deep UV, DUV, and VUV exposure, as well as dual exposure and sub-resolution exposure.