Used ULTRATECH 1000 #9023151 for sale

ULTRATECH 1000 is a state-of-the-art wafer stepper designed for lithography process steps in plating, diffusion, etch, and other integrated circuit fabrication procedures. In a noteworthy development, it is equipped with an exceptional combination of innovative features for high-end performance. Capable of process flexibility and speed, the stepper has a highly configurable optics and motion platform. It is powered by a high-performance servo servomotor that reduces the time taken for chip completion in a multitude of tasks. It is also equipped with an acceleration and speed control equipment (A/S-C) that provides unmatched performance when used for continuous printing. This system features a unique combination of motor speed, zoom and focus parameters for ultra-fast printing rates. Further, 1000 is armed with a technology cascade of topography and bidirectional lithography that allows for application-specific control and accuracy. This provides users with well-defined directionality of exposure, resulting in superior yield and reliability even in complex device fabrication steps. The advanced unit is also well-suited to maintain the highest uniformity of exposure across the whole wafer, enabling maximum reproducibility of process results. The device's superior exposure capabilities can be attributed to its cutting-edge "Centrisys" optical machine which integrates a combination of both beam splitting and quadrants exposure operation. This allows the soft contact imaging to be accurately characterized by a single optical parameter. Moreover, ULTRATECH 1000 is equipped with powerful and advanced software that enables swift and efficient control of the stepper. MyWaferTM software and maintenance boards provides users with a comprehensive control environment to easily and conveniently configure the parameters for exposure and alignment, as well as monitor temporal processes like wafer cleaning and wafer loading. 1000 also features a user-replaceable high intensity long-life flash lamp, as well as a variable field exposure (VFE) option, both of which ensure high quality results in a single operation. To top it off, the tool is designed to be simple, clean and reliable, and requires minimal maintenance to function at its highest level of performance. This all makes ULTRATECH 1000 an ideal solution for any industrial or academic lithography requirement.