Used ULTRATECH 1000 #9214696 for sale

ULTRATECH 1000 is a wafer stepper designed to provide lithography services in wafer fabrication. It is a highly precise tool capable of taking a physical pattern and transferring it onto each individual wafer. The stepper is engineered to auto-align wafers, precisely focus, and achieve accurate edge-placement for each application. 1000 has an outstanding aperture mask imaging system, which is one of its key features. It has a highly versatile MaskFlex Plus reticle handler, which can easily handle a wide range of reticles. The stepper also has an automated lens positioning system which allows for precise pattern placement. ULTRATECH 1000 is designed for maximum efficiency and productivity. It allows users to process up to 3 wafers simultaneously and can be integrated into existing wafer processing systems. The stepper can also handle various types of wafers, such as SOI, porous SiO2, sputtered, polished, or untreated. 1000 is capable of numerous functions and features, including reticle imaging, alignment tool support, stepper control, recipe server, multiple jobs, automatic wafer exchange, and automatic clean. It has the ability to work with multiple exposure technologies, including deep UV, DUV (deep ultra-violet), i-line, KrF, e-beam, and multiple lithography techniques. The stepper is built to operate with a maximum resolution of 5 microns, and supports several reticle formats of size 100 mm diameter or smaller. It has an extremely fast exposure time and can process up to 300 wafers per hour. ULTRATECH 1000 is extremely simple to operate and very reliable. It has been designed to allow for fewer maintenance requirements and help users avoid any unexpected costs. It also has built-in safety features which minimize risk of mistakes or damage to the machine, as well as advanced diagnostics which can quickly detect any malfunctions or errors. All in all, 1000 is a top of the line wafer stepper, with an ability to accurately and precisely transfer designs and patterns onto wafers. Its fast exposure times and ability to efficiently handle multiple wafers at once make it ideal for processing large-scale orders in a timely manner.