Used ULTRATECH 1100 #9238245 for sale

ULTRATECH 1100 is a highly advanced deep UV (DUV) dry photo lithography equipment designed to meet the demands of leading semiconductor manufacturers. It has a stepper and scanner configuration that produces superior imaging and overlay accuracy at various wafer levels. The system offers a wide range of applications including patterning of advanced wafer level chip-scale packaging (WLCSP), through-silicon via (TSV) technologies and ultra-thin wafer/tape-less bonding. 1100 can provide high imaging resolution down to a minimum of 0.25 micron (μm) Resolution. Additionally, it has the highest overlay accuracy available on the market of 0.3μm at 20mm. The built-in optical unit is optimized for an ultra-low working distance which minimizes the effects of wafer edge distortions on the image accuracy. Also, the stepper incorporates the latest technologies in Image-Based Self Calibration (IBSC) as well as Chromatic Restrain Alignment (CRA), delivering superior imaging performance, as well as environmental stability and high productivity. ULTRATECH 1100 dry stepper is capable of patterning very precise features as small as 0.1μm x 0.1μm across the entire substrate area, eliminating the need to use multiple exposure techniques such as stepped exposures. Some of the other features of the machine include advanced Background Subtraction, Accu-Clamp Tool for enhanced focus accuracy, and Vertical Displacement Alignment (VDA) with support for up to 15kHz data input frequencies. 1100 comes with a user-friendly graphical user interface, high precision flat-field illumination, and advanced camera asset, with support for 32-bit CMOS digital video capture and the latest image processing algorithms. For full model productivity, the stepper is equipped with a remote I/O interface and Ethernet remote control, enabling a seamless transition between multiple systems. In addition, ULTRATECH 1100 includes a range of value-added features to meet the specific needs of different production processes, such as automatic lens change-over and motorized wafer movement. With its comprehensive stepper capability, 1100 can offer both high-accuracy imaging techniques and high throughput throughput applications.