Used ULTRATECH 1500 MVS #9229103 for sale

ULTRATECH 1500 MVS (MaskApply II Stepper Equipment) is a specialized wafer stepper used for the direct imaging of photomasks used in semiconductor manufacturing. The system is designed to rapidly and accurately create photomask patterns for use in lithographic processes that produce integrated circuits. 1500 MVS is capable of producing 3 in dice at resolutions up to 2 microns. It utilizes SynBit proprietary technology for robust alignment and process automation. The unit features a high-precision wafer handling machine, an antistatic control tool, a precision beam tilt adjustment asset, and a stellar image projector. The MaskApply II Stepper Model is designed to meet the needs of semiconductor process engineers. It features a suite of hardware and software components that work together to make a number of complicated imaging processes easier. The equipment provides high performance and consistency, achieving throughput up to 2100 wafers per hour. The MaskApply II Stepper System offers several advanced features for improved accuracy and speed. In addition to tilt and focus systems, ULTRATECH 1500 MVS features an integrated optical microscope and an advanced vacuum controller. This integrated optical microscope makes it possible to accurately inspect mask patterns before the pattern is printed onto the wafer. And the advanced vacuum controller helps to minimize stress on the mask while maintaining uniform illumination and image focus. In addition to these features, 1500 MVS offers an integrated software package which allows users to create, analyze, and optimize process recipes. Other features include an alignment tracking unit for accurate mask positioning, preloaded databases to facilitate the comparison of process recipes, and an integrated particle monitoring machine. Overall, ULTRATECH 1500 MVS is a powerful and reliable wafer stepper that is suited for operation in a variety of semiconductor process environments. The tool provides a robust set of features and capabilities that make it ideal for direct imaging of photomasks, and for lithographic processes that produce integrated circuits.