Used ULTRATECH 1500 #9018358 for sale

ULTRATECH 1500 is an advanced production-scale wafer stepper with a patented rotating-scanning exposure system. It offers high-efficiency scanning capabilities, combined with high resolution imaging, for use in microelectronic production. With its compact, reliable design, 1500 provides excellent performance for exposing multiple layers of photomasks or wafers with repeatable results. ULTRATECH 1500 features an integrated cluster of four wafer stepper arms, each with two independent exposure systems. This cluster of steppers is driven by precision linear and rotary actuators to provide precise and repeatable alignment. Its linear and rotary actuators also enable high accuracy synchronization and seamless motion for independent control of the scanning slit and the wafer. 1500 is capable of producing precision images up to 36μm (0.0014") in size with a precision image placement accuracy of 15μm (0.0006"). ULTRATECH 1500 includes a unique image processing module which enables automated image positioning, registration and exposure optimization using the latest industry algorithms. This module offers the highest speed and accuracy in the market, with up to 40000 exposures per hour. Some of the making capabilities include 1:1 scale exposures for finer details; multiple exposures for greater depth; precise image shifting for wafer shots; and automatic image masking. In addition, 1500 features a user friendly graphical user interface (GUI) with touch screen controls and visual guidance. This intuitive, easy-to use GUI enables the user to program exposures with simple adjustments and minimal error. ULTRATECH 1500 also includes user-defined management of exposure parameters, including scan direction, the number of images, sub-exposed images, field exposure power and dose. 1500 is ideal for a wide range of applications, particularly for complex microelectronic production processes. It provides an unmatched level of precision and accuracy, making it an invaluable tool for any production environment.