Used ULTRATECH 1500 #9182694 for sale

ULTRATECH 1500 is a next-generation wafer stepper that is specifically designed to optimize the accuracy, throughput, and complexity of substrate processing for integrated circuit (IC) fabrication. The device utilizes advanced dynamic motion controls to precisely scan, align, and focus topographies on the substrate in order to reduce defect levels on the resulting wafer. It is equipped with a 6-axis dynamically tuned air bearing for precise focus and motion control, and is capable of pattern placement accuracy of around 2µm with a resolution of 1µm or better. The device is designed for advancing semiconductor development with its precision stepper motor and a comprehensive suite of imaging, patterning, and lithographic capabilities. It uses an auto-scanning scanning feature to quickly detect and resolve wafer defects, ensuring superior level of wafer accuracy. The motor operates with a maximum speed of 250mm/sec for maximum throughput. To facilitate quick access to the stepper, 1500 also comes equipped with a large automated loading and transport system. ULTRATECH 1500 is designed with a variety of user-friendly features such as automated wafer alignment and auto-teaching, allowing for easy operation and substantially shortened setup times. Its ultra-high speed sorting capabilities can categorize and process micro-defects and polygonal patterns while providing maximum throughput. A pattern library enables users to quickly and accurately generate custom patterns. The device is also designed for highest level of substrate zoning, quality control, and uniformity. It is equipped with a sophisticated optical short-wavelength alignment system, customizable image parametrics, and a patented Exposure Measurement System (EMS) to measure critical exposure processes with a wide range of exposure levels. Furthermore, 1500 is equipped with a redundancy scheme to ensure the highest wafer scheduling efficiency. In conclusion, ULTRATECH 1500 is a premium wafer stepper designed to yield maximum accuracy, throughput, and complexity in semiconductor development. Its precise motion controls, image parametrics, pattern library and optimized substrate zoning enable enhanced level of precision and quality control in IC fabrication.