Used ULTRATECH 1500 #9198561 for sale

ULTRATECH 1500 Wafer Stepper is a top-of-the-line precision exposure equipment used for photolithography. It is designed for production run as well as low-volume prototyping, making it an excellent tool for engineers and technicians from the semiconductor industry. 1500 features the latest in stepper technology, providing secure and accurate optical and nanometer control. It is equipped with a motorized component stage and comes with a 630 millimeter square oculus for large substrate alignment. Additionally, its fully automatic wafer registration system has the ability to detect, measure and align the wafer before exposing. This ensures highly precise and accurate exposure patterns, even at ultra-short wavelengths. ULTRATECH 1500 employs a dual-photo extend unit to provide high-resolution images with low noise. This machine ensures that each line print is as clear and accurate as possible and is designed to reduce aperture violations. The tool also includes a high-efficiency, variable-angle convex mirror assembly and a zoom-enabled objective lens which provide a quick and easy way to adjust the imaging parameters. In terms of performance, 1500 offers a scan speed of up to 18.6 inch/minute and a substrate size of up to 8 inches. It also has an open asset architecture that allows users to integrate custom lenses, image simulation software, and other tools. In addition, the stepper offers auto-calibration for repeatable performance and automatic exposure synchronization to deliver repeatable results. Lastly, the stepper is backed by ULTRATECH two-year warranty for enhanced peace of mind. In conclusion, ULTRATECH 1500 Wafer Stepper is an ideal solution for producing precision images with minimal noise and distortion. Its dual-photo extend model guarantees clear and accurate lines prints with little aperture violation. On top of that, its top-of-the-line stepper technology allows users to achieve precision and accuracy even at ultra-short wavelengths and features auto-calibration for repeatable performance. Lastly, its open equipment architecture allows users to integrate custom lenses, image simulation software, and other tools.