Used ULTRATECH 1500 #9244164 for sale

ULTRATECH 1500 is a wafer stepper designed specifically for providing high-accuracy photolithography for the production of semiconductor chips and other intricate electronic components. This advanced piece of equipment features a laser-powered iris to provide the most accurate alignment and imaging of very tiny circuits on various substrates. Its unique features enable it to process wafers with extreme accuracy while also reducing the time required to expose wafers. 1500 features a 5-axis stage and a state-of-the-art optics equipment that allow for exact alignment for accurate exposure. This piece of equipment produces multiple exposures on a single wafer with minimal misplaced vias and minimal yield loss. Additionally, ULTRATECH 1500 can produce a wide range of circuit sizes and patterns with a ±0.25µm accuracy. 1500 is also capable of accommodating 10 different wafer sizes which makes it versatile and extremely efficient. The system is also equipped with advanced computer control software that can be programmed for up to 500 different source patterns to be pre-programmed for ultra-precise pattern exposure. Additionally, ULTRATECH 1500 is integrated with an intelligent wafer ID recognition unit for quick and accurate wafer identification. 1500 is equipped with cutting-edge imaging capabilities that can create lines down to 0.4µm. This wafer stepper also features a unique laser focus-spot control which enables it to adjust its focus during exposure for absolute accuracy. ULTRATECH 1500 also has an automatic laser power control machine that maintains its laser power at the preprogrammed level so that exposure is always accurate, even when processing multiple wafers. In conclusion, 1500 is the ideal wafer stepper for processing complex, tiny circuit patterns with a high degree of accuracy and minimal yield loss. Its unique features such as its 5-axis stage, laser power control, intelligent wafer ID recognition, and its adjustable focus-spot control guarantees highly precise and repeatable photolithography.