Used ULTRATECH 1700 #9202973 for sale

ULTRATECH 1700 is a wafer stepper designed for photolithography applications. It uses advanced technology to create high-quality patterns on flat substrates. The machine is equipped with a 6-axis equipment, allowing for precise alignment and control. The stepper also features a long working area and a high-resolution laser alignment system. 1700 utilizes a Source Mask Optimization (SMO) unit for increased accuracy and repeatability. This reduces the time required for pattern definition, resulting in a more productive manufacturing process. The stepper is also capable of supporting multiple exposure fields, allowing for rapid production of high-complexity patterns. The machine utilizes a variable slit-lamp for illumination and exposure, with a 1.5 - 7.0 factor focus range. Throughput is further enhanced by a high stable, high-speed beam deflector and fixed layout. The stepper has reduced exposure time and improved exposure uniformity, providing higher designability and higher yields. ULTRATECH 1700 offers cutting-edge ergonomic design and automatic handling. The machine includes a user-friendly graphical user interface, a unique feature for intuitive and easy control. The stepper is also capable of multiple positional steps in the same exposure set. 1700 is ideal for a wide range of photolithography applications. Its combination of high throughput, directional exposure, and multilevel alignment ensure it is the best choice for high-precision substrate processing. Its unmatched stability ensures high accuracy and repeatability, resulting in superior devices and components.