Used ULTRATECH 2244i Series #293628682 for sale
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ID: 293628682
Wafer Size: 4"-8"
Stepper, 4"-8"
G&H Line optics
Lamp, 1000 W
Extended focus option for thick resist exposure capability
GENMARK Robot
Reticle, 5" (Capable of upgrading to 6")
Reticle barcode reader
COGNEX Machine Vision System (MVS)
Maximum FOV: 44 mm x 26.7 mm
Numerical aperture: 0.32
Auto aperture.
ULTRATECH 2244i Series is a state-of-the-art wafer stepper designed for the most advanced photolithographic processes. It features a highly reliable, full-size wafer stage to handle a maximum wafer size of 200 mm. The system offers excellent accuracy and repeatability through its advanced, one-axis scanner design. Utilizing 0.74 NA projection optics, the two-stage scanner delivers both high resolution and high speed scanning, with beam positioning accuracies up to 1 nanometer. ULTRATECH 2244i is also capable of scanning different exposure field sizes and exposure times, making it suitable for a variety of photolithography processes. ULTRATECH 2244i also utilizes its advanced optics to provide various scanning modes, including step-and-repeat, continuous line and area raster scanning. It also automates lens alignment, exposure and zoom settings to help ensure consistent and repeatable results. The system features a user-friendly control panel with a 10-inch color touchscreen interface that displays an intuitive graphical user interface. This allows for numerous scan and exposure parameters to be set up quickly, batch processing and archived exposure settings. The user can also create exposure recipes and store them in the scanner's library. ULTRATECH 2244i also offers many process support tools, including multiple modes of backside processing, automated focus recognition, and alignment accuracy control. It is fully compatible with ULTRATECH process control software, providing additional process control and simulation capabilities. Moreover, ULTRATECH 2244i features an advanced mount robot module, which allows for quick and efficient wafer handling. It also has an optional clean chamber for an effective contaminant protection system. All in all, ULTRATECH 2244i provide users with a powerful and accurate tool for photolithography.
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