Used ULTRATECH 900 #131416 for sale

ULTRATECH 900 is a comprehensive, modular, multi-field critical dimension metrology equipment developed as a wafer stepper to handle a wide range of metrology applications. The system is targeted at the mainstream stepper market, providing critical dimension (CD) measurements of photo-defined features on patterned surface layers of semiconductor substrates. 900 is capable of both analytical and non-analytical wafer stepper applications. It features a unique, high-resolution measurement motion unit that can rapidly and accurately measure fine-line features. It has a three-axis configuration, consisting of a precision rotation stage, a shallow-angle motion stage, and a sample placement stage, each of which can be driven in two axes (x, y). The sample placement stage provides horizontal and vertical travel across the sample surface, enabling alignment of the test pattern for optimal measurement with minimal distortion. The stepper is designed to support rigorous metrology tasks with high levels of repeatability and accuracy. It is capable of measuring the surface profile at the nanometer scale and can detect even the smallest feature sizes. The rapid scanning and sample-scanning modes make the machine ideal for applications such as CD measurement, non-contact imaging, wafer mapping, and defect inspection. ULTRATECH 900 is also equipped with an advanced optical tool. It features two high-resolution imaging systems and a patented Beam Hairpin Technique that allows for the measurement of high aspect ratio features on the same substrate. The asset's high sensitivity allows for the detection of defect types with very small feature sizes. Additional features include a high-speed wafer map plotting feature that can rapidly create an overlay/pattern map of the entire wafer as well as a particle inspection model to detect and identify defects. 900 also uses advanced technology for the scanning, imaging, and analysis of CD measurements. The equipment's advanced software allows for multiple layer analysis, CD profile generation for overlay/stage correction, parallel processing for faster throughput, and an integrated data management system. It also has a registration module so that any test patterns can be used for CD measurement on the same substrate. In conclusion, ULTRATECH 900 is an advanced and comprehensive wafer stepper that provides a comprehensive set of features and capabilities for critical dimension (CD) metrology. It is capable of both analytical and non-analytical applications and provides a high level of accuracy and repeatability in measurements. The unit also incorporates advanced optical systems and software for precision scanning, imaging, and measurement.