Used ULTRATECH AP 300 #293595884 for sale

Name: ULTRATECH AP 300
Brand: ULTRATECH
SKU: 293595884
Availability: InStock

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Wafer Steppers

Manufacturer

ULTRATECH

Model

AP 300

ID: 293595884

Vintage: 2006

Stepper, 12" Standard features target: 2 µm Standard field: 44 mm x 26.7 mm Test reticle: 6 x 6 Wafer thickness handling: 0.4 mm - 2 mm Universal size / Wafer kit: 8" and 12" FOSB Cassette to cassette wafer handling PATMAX MVS Alignment system MVS Alignment spectrum: 530 nm - 570 nm Dual lamp illuminator, 1200 W GHI-Line broadband lens GHI-Line auto filter changer FOUP Wafer handler Extended field 6-Slots reticle stack manual front loading GEM HSMS Communications Environmental chamber Enhanced bottom pellicle protection Closed loop cooling Prism purge kit Dual flip aperture size: 44 mm (Largest) Power source: 208 V, 150 A, 3-Phase, 5-wires 2006 vintage.

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ULTRATECH AP 300 is a fully automated wafer stepper specifically designed for advanced lithography applications. It is a 3-axis wafer stepper that can support a substrate size of up to 300mm, with a minification rate of 5:1. Its maximum scan velocity can reach up to 10000mm/sec, and it also offers an acceleration of up to 80000mm/s². ULTRATECH AP300 supports two image-projection modes: Knoll-Hart and Galvo. The Knoll Hart mode projects multiple laser beam spots simultaneously, which enables a shorter exposure time; the maximum resolution can reach up to 0.3µm. On the other hand, the Galvo mode has the advantage of providing a uniform intensity profile, with a maximum resolution of 0.7µm. Additionally, the unit can perform high-speed scanning of 2D patterns. AP 300 is designed with multiple safety features to protect against damage during operation. The first safety feature is the re-calibration mechanism, which is able to automatically recalibrate the system after every exposure. This restores the original resolution, ensuring accuracy at all times. The second feature is the enhanced self-protection mechanism; this is able to detect any errors that occur during lithography and immediately stop the process. AP300 also features an industrial grade touchscreen to enable hassle-free operation. It provides a full graphical user interface, allowing users to easily view and control the system. In addition, the unit is equipped with the sophisticated OMR interface, which allows users to monitor the entire process from start to finish. Furthermore, ULTRATECH AP 300 offers a customizable environment to ensure optimal performance in various lighting conditions. This can range from standard illumination to darkroom conditions, enabling users to customize the environment for each application. ULTRATECH AP300 is designed to provide superior accuracy and reliability for advanced lithography applications. Its high-speed scanning and precision laser projection make it an ideal option for research and industry applications alike. The unit's advanced safety and intuitive interface ensure a simple and accurate operation for any user.