Used ULTRATECH AP 300 #293631544 for sale

ULTRATECH AP 300 is a step-and-repeat wafer stepper designed for high-volume photolithography applications. This piece of equipment is engineered to provide reliable and accurate production of vertical field-of-view (FOV) wafer stepper by precisely projective aligning and transferring patterns from photomask onto the wafer. It offers a resolution of 0.25μm, minimum feature size of 0.17μm, and a focus variation of 0.008μm. The state-of-the-art engineering of ULTRATECH AP300 grants it an industry-leading speed with roundtrip times as fast as 0.35 second for fine alignment wafers and 0.9 second for not-so-fine aligned wafers. Moreover, the ability to produce up to 10,000 wafer per hour makes it a time and cost-effective machinery. The wafer stepper is driven by a highly sophisticated and accurate motorized X-Y stage. The motorized stage features sub-nanometer resolution and a positioning accuracy of 0.2μm. This powerful motor will help ensure that the high-speed motions of the device will remain within the defined accuracy. This will help in increasing the throughput for wafer stepper applications. AP 300 includes a durable and compact housing design with a high-definition 12.7" 700 TVLine color monitor and a 3D viewing system. The viewing system is perfect for monitoring and inspecting the process of lithography without any disruption. Additionally, the viewing system is integrated with sophisticated optics, allowing it to inspect wafers with an accuracy of 2μm and a field of view of 860-1200μm. In order to optimize the use of the wafer stepper, AP300 is designed with user-friendly software which allows users to program a wide range of operations. The software is also compatible with manufacturing engineering language (MEL), allowing users to control the operation in an efficient manner. For its rigidity, accuracy, and operation rate, ULTRATECH AP 300 is an efficient and reliable wafer stepper. It has application in the semiconductor, flat panel display and other related industries to produce photomask transfers with improved consistency and productivity.