Used ULTRATECH AP 300 #9236556 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom


Sold
ID: 9236556
Wafer Size: 12"
Vintage: 2008
Stepper, 12"
Operating system: Windows
Intensity: 2500 (mw/cm²)
Wave length: D, H, I Line
DOF: 5 um
Resolution: 200 nm
Field size: 44 x 26 mm
Lamp uniformity: 3.07%
Type: SMIF
Automation line component: GEM
Reticle size, 6"
Wafer of type
Illumination: Standard
Main shutter: Standard
Booth unit
Reticle changer
Reticle cassette
No reticle cassette bar-code
Reticle bar-code reader
TAG Reader
No pellice particle check
Intensity meter holder / Display
High precision N rotation PA parts
CDA Filter: Organ In-organ
Signal tower
No double cassette elevator
No HeNe unit modification unit
Remote E-console: Single
Recipe server
Stage:
Scan speed: 250 mm/sec
Chuck: Ring chuck
Electric power: 208 V / 60 Hz
2008 vintage.
ULTRATECH AP 300 is a wafer stepper that provides the highest degree of performance and accuracy available for automating processes in semiconductor fabrication. It is a multi-axis automation equipment featuring sophisticated wafer handling, highly accurate metrology and advanced optics. ULTRATECH AP300 takes its name from its advanced precision technology - "Advanced Precision" or "AP." AP 300 utilizes a sophisticated, multi-axis positioning system with <1000 nanometer accuracy, ensuring that it is able to accurately process devices differently when necessary. With its impressive accuracy, it can effectively profile edge textures across a given device, so as to achieve the desired end product. AP300 also features advanced optics that can achieve resolutions up to 10 microns and peak wavelengths as short as the visible spectrum. With its advanced optics, ULTRATECH AP 300 is able to measure defects with unprecedented accuracy. From the critical diameter and depth measurement of diffraction gratings to the high accuracy of tilted targets, ULTRATECH AP300 allows for superior inspection of device surfaces. Furthermore, AP 300 features a sophisticated wafer handling unit that allows for rapid processing. Focusing on device complexity and input/output conditions, the wafer handling machine of AP300 optimizes throughput for wafers of all sizes. Overall, ULTRATECH AP 300 is a sophisticated, multi-axis wafer stepper that offers the highest degree of performance and accuracy available for automating processes in semiconductor fabrication. It features advanced optics with resolutions up to 10 microns, and a highly accurate multi-axis positioning tool with <1000 nanometer accuracy. ULTRATECH AP300 also offers a sophisticated wafer handling asset that enables efficient throughput. Highly reliable and cost effective, AP 300 provides a powerful automation solution for quality improvement, throughput optimization and semiconductor device manufacturing.
There are no reviews yet