Used ULTRATECH AP 300 #9248655 for sale

ULTRATECH AP 300 wafer stepper is one of the most advanced wafer steppers available today. It is designed to provide ultra-precise patterning of large-volume wafers at the nanometer level. The equipment is equipped with a high-precision diaphragm pump that maintains the highest level of accuracy and repeatability even at high process rates. The system's large stage size allows for high-throughput patterning of large samples and accurate positioning of the entire feature set of the wafer to be patterned. ULTRATECH AP300 features an advanced motion control platform with both open-loop and closed-loop control, allowing for maximum control over the unit's repeatability and precision. The machine also features an ultra-precise laser interferometer for position feedback, along with ULTRATECH patented Pulse Width Modulation (PWM) motors for ultra-precise speed control. This allows for accurate, repeatable nanometer-scale patterning across the entire wafer surface. AP 300 utilizes a rich feature set that allows for the rapid set-up of processes. It is compatible with multiple lithography techniques, including UV, KrF, e-beam, and more. The tool can be used to direct pattern etch, define critical dimensions, create patterns in 3D, and more. It also utilizes an automated pattern creation asset allowing users to quickly configure new processes. AP300 also includes several safety and environmental features. The model includes safety cut-outs, enabling it to shut down automatically if something goes wrong, as well as precautionary measures for minimizing environmental pollutants. Additionally, the equipment automatically performs regular maintenance such as cleaning and checking for wear and tear, helping to extend the system's lifespan. Overall, ULTRATECH AP 300 wafer stepper is a powerful, reliable, and ultra-precise unit designed to provide industry-leading patterning precision across large surfaces. Its advanced motion control machine allows for incredibly repeatable and precise positioning of features, while its automated pattern creation tool and safety features ensure that processes are executed quickly and safely. ULTRATECH AP300 is capable of achieving nanometer-level patterning accuracy, and it is ideal for the rapid and accurate patterning of large wafers.