Used ULTRATECH AP200 #293630413 for sale

Manufacturer
ULTRATECH
Model
AP200
ID: 293630413
Vintage: 2006
i-Line stepper Dual illuminator CLC Controller Field size: 44 x 26.7 2006 vintage.
ULTRATECH AP200 is a multi-dimensional, high-precision wafer stepper designed for accurate lithography in the fabrication of integrated circuits. This innovative machine is capable of accurately placing patterns on wafers with a 400 nm resolution, using a direct imaging technique with precise repeatability. ULTRATECH AP 200 is equipped with a two-dimensional stage, which can be moved in the X, Y and Z axes. This stage is actuated by three direct drive motors which are precise and quiet, providing efficient positioning of the wafer. The stepper also features a double-level process controller, multiple full-frame areas, and a field-programmable gate array (FPGA). All of these components work together to provide the high-precision alignment, precision overlay and repeatability performance necessary for a successful lithography run. In addition to precise motion control, AP200 is also equipped with advanced imaging capabilities. It features a full-frame interline transfer CCD (charge-coupled device) camera and an array of light emitting diodes (LEDs) which provide accurate imaging at various smaller field sizes. The LEDs can be switched on and off in order to switch between different exposure field sizes, while the camera is used to monitor the entire area in order to ensure that no errors are made. In order to ensure the highest accuracy during lithography runs, AP 200 is also equipped with a host of advanced metrology and wafer handling features. This includes auto-focus and auto-alignment capabilities to ensure that patterns are accurately aligned on the wafer. It also has a wafer handling mechanism which allows it to accurately place and remove wafers without any risk of damage or contamination. In summary, ULTRATECH AP200 is a multi-dimensional, high-precision wafer stepper designed for accurate lithography in the fabrication of integrated circuits. It features precise repeatability, a two-dimensional stage, advanced imaging capabilities, a full-frame interline transfer CCD camera, array of LED lights, auto-focus and auto-alignment capabilities, as well as a safe and efficient wafer handling mechanism. All of these features make it an ideal solution for any lithography needs.
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