Used ULTRATECH LC 37 #9036437 for sale

ULTRATECH LC 37 is a multi-feature and cost-effective wafer stepper that offers powerful lithographic precision and superior equipment reliability. The system was specifically designed to meet the demands of high-volume production environments, providing high-resolution imaging, accurate patterning on 6-inch wafers, and reliable and repeatable performance with every exposure. The sophisticated software offers easy to use design, alignment, measuring, and exposure functions through its graphical user interface. The user interface guides the operator through the entire process, with intuitive features and settings, so that accurate patterns can be created in less time and with fewer errors. It also offers advanced features, such as job scheduling, misalignment adjustment, and an array of optical settings such as Auto Bright Field and Auto Tone Control. The unit is equipped with an advanced wafer-handling machine allowing the exposure of wafers up to 12-inch in diameter. The patented tool utilizes a unique air-bearings conveyor operation resulting in very accurate and repeatable movements in both the X and Y axes. It also offers a two-stage positioning asset capable of accurately and repeatably delivering a 6-inch wafer from the cassette to the exposure area with a positioning accuracy of 3 μm. Additionally, the model is powered by a high-power light source for excellent exposure uniformity. Its pulsed UV laser provides a uniform exposure across the entire wafer. This ensures that the utmost resolution is achieved by eliminating non-uniformity. The power of the UV laser and the darkness of the walls makes it the perfect choice for high-volume exposure. This wafer stepper also features a semi-open architecture and a modular equipment that offers the flexibility of upgradeability as the latest technology emerges. It is able to integrate with external tools for advanced lithographic requirements, as well as comprehensive programming and communications options. Furthermore, it comes with a comprehensive set of essential lithography process tools such as auto alignment, focal point determination, as well as electron column metrology. Overall, LC 37 is an excellent solution for high volume applications and offers superior performance and reliability. The system's features and capabilities provide excellent performance, accuracy, and cost-efficiency, allowing organizations to minimize downtime and maximize throughput and production yields efficiently.