Used ULTRATECH LSA 100 #9298839 for sale

ULTRATECH LSA 100 is an advanced wafer stepper designed to provide precise and accurate alignment on a variety of substrates and wafer sizes. ULTRATECH LSA100 is a high-precision positioning equipment with a superior linear slide assembly and a rotational encoder for accurate angular positioning. It is a fully automated tool that is capable of performing photolithography and exposure to multiple substrates or wafers. The system offers high throughput, excellent positioning accuracy, and unique image and process control. The unit utilizes a patented magnetic lift machine to achieve controlled, uniform movements during the various process operations. The tool also features a unique, high resolution, and robust laser interferometer-based alignment asset that ensures precise and consistent alignment between the model and the wafer substrate. The equipment supports a variety of wafer sizes, including 4" and 6" round substrates. Additionally, the system works with a variety of optical imaging systems, making it ideal for exposure at various wavelengths and resolution. LSA 100 also offers a sophisticated process control unit that allows users to control the exposure processes precisely. This machine supports multiple exposures on the same substrate to allow for variations in exposure time or energy intensity. Additionally, the tool also comes with an advanced 3D measurement asset that allows users to adjust and optimize the exposure parameters as needed. LSA100 utilizes advanced automation technologies to ensure precise, repeatable, and accurate processing. Its programmable motion control model allows users to take advantage of advanced image-based process control. The equipment also has sophisticated reporting features that enable users to monitor the various process parameters during production. Overall, ULTRATECH LSA 100 is an advanced wafer stepper designed to provide users with superior precision and accuracy on a variety of substrates and wafer sizes. Its magnetic lift system, laser interferometer-based alignment unit, process control machine, and advanced automation technologies make it an excellent choice for photolithography and exposure applications. The tool is designed to deliver the best possible image quality, process reliability, and outstanding throughput.