Used ULTRATECH Multipol #293607366 for sale

ULTRATECH Multipol is a wafer stepper used in the semiconductor device manufacturing industry. It is a highly precise, high-yield tool designed to pattern microstructures on semiconductor chips. It produces devices with sizes ranging from one micron to 32 microns. Multipol utilizes a scan lamp, which consists of an X-Y motorized scanning stage, to form the microscopic structures on the wafer surface. The scan lamp is fitted with a variety of objective lenses that can range from 5-50 mm in diameter with an Angle of Incidence (AOI) of 0-90 degrees respectively. ULTRATECH Multipol makes use of variable-sized stages that can produce patterns on up to 12" wafer substrates. It is capable of projecting images from 4X to 50X and offers the flexibility to pattern either step-and-repeat, scan or a combination of both. It has a resolution of better than 1nm with a maximum exposure time of 10 milliseconds. This stepper is characterized by its high-intensity, light-tight illuminations, which provide optimal patterning performances. Multipol also makes use of advanced control algorithms, allowing for accurate stepper control and optimization. It is also equipped with a programmable user interface, allowing users to customize their patterning ability. The user interface can be tailored to the specific requirements of each application, to ensure that the device is able to perform its intended function with the utmost precision. Additionally, ULTRATECH Multipol contains a number of safety features to ensure that the wafers and devices are not damaged during operation. This includes an anti-reflection shutter, a beam aligner and a vacuum chuck that ensure that the particles are not damaged during maintenance. The stepper is also equipped with an auto-focus system and vision correction system, allowing the lenses to adjust to the wafer's surface in order to maintain the highest level of accuracy during the patterning process. Overall, Multipol is an advanced wafer stepper with the ability to pattern both small and large wafers with precision accuracy. It offers the capability to operate both in step-and-repeat and scan mode, and its user interface can be tailored to fulfill the customer's specific requirements. It also offers a number of safety features to prevent device damage. All these factors support its success in the semiconductor device manufacturing industry.