Used ULTRATECH Sapphire 100 #293645247 for sale

ULTRATECH Sapphire 100 is a multi-field hierarchical wafer stepper specifically designed for MEMS, optoelectronics & other semiconductor applications. It is an advanced tool equipped with the latest lithography, metrology and automation technologies. This tool has an ultra-fast, sub-half micron step size, as well as a maximum repeatable accuracy of ±1 micron. It also offers a highly flexible range of drive pulses, process parameters and customization to ensure enterprise-level production. Sapphire 100 is an economical, high-performance stepper ideal for applications that require an extremely high precision. It has the capability to accurately and seamlessly deliver exact pattern shapes, feature sizes and positional accuracy. This makes it a great choice for the fabrication of essential devices such as micropackages, MEMS, SOI, advanced switches and multi-aperture lenses. The stepper is equipped with a powerful, high-speed controller and optimized optics, comprised of multiple lenses and multicolor and high-power LED illumination sources. This system enables the scanning of substrates at up to 5x step sizes of 1 μm and beyond, with maximum process accuracy of ± 0.5 μm. The multi-field hierarchical stepped scan technology reduces time to market and improves throughput, with over 600 parts per hour. ULTRATECH Sapphire 100 has been finely tuned to deliver superior image quality, greater throughput and harmonic illumination optimization. It also features an in-situ cleaning system to ensure strict contamination control standards, as well as diagnostics and automated process data analysis to minimize scrap and boost yield. Additionally, Sapphire 100 has a user-friendly interface for programming complex geometrical shapes, with the option for multiple user accounts for improved workflows. Overall, ULTRATECH Sapphire 100 is an essential tool for MEMS, optoelectronics and other semiconductor applications. Combining precision and flexibility, its superior image quality, multi-field hierarchical scanning, advanced control system and in-situ cleaning make it ideal for high-performance and cost-effective production.