Used ULTRATECH Sapphire 100 #293645287 for sale

ULTRATECH Sapphire 100 is a high-precision, high-throughput lithography equipment that is capable of producing precise patterns on a variety of substrates. This stepper is designed for advanced research and development applications, allowing manufacturers to accurately and efficiently transfer thin-film and photonic structures onto substrates. Sapphire 100 features an array of technological benefits that allow users to accurately reproduce patterns and structures with high fidelity and reliability. The system's integrated pattern generator automatically and conveniently generates the most precise structures, with no user intervention needed throughout the process. In addition, the unit produces high-fidelity resolution of up to 1.5 μm. ULTRATECH Sapphire 100 also features an enhanced scan-day field size which can produce line widths under 0.25 μm, and it is capable of working with wafers that measure up to 5 inches across. This stepper also features an integrated interface with a variety of third-party software and systems, allowing for easy integration of datasets, to enable users to quickly produce accurate patterns and designs. Sapphire 100 features an automatic scan-day efficiency and automated focus monitoring that work together to ensure optimal accuracy and repeatability. This machine also features a variety of exposure options for producing the highest fidelity of micro-structures, such as medium resolution masks and fine line designs. The tool is also equipped with advanced temperature control, dust reduction capabilities, and low vibration levels which contribute to the asset's overall accuracy and performance. ULTRATECH Sapphire 100 comes with a variety of hardware and software accessories, including an auto-load/eject feature, a laser light source, an alarm model, and a variety of networking and data management options. With a compact and ergonomic design, this equipment is user-friendly and easy to install and maintain. The system is also capable of integrating into a broad range of manufacturing operations. In conclusion, Sapphire 100 is a high-precision, high-throughput lithography unit designed for advanced research and development applications. This machine features an array of technological benefits, including a pattern generator, high-fidelity resolution, an enhanced scan-day field size, exposure options, temperature control, dust reduction capabilities, and low vibration levels. It is user-friendly and can be easily integrated into a variety of manufacturing operations.