Used ULTRATECH Sapphire 100 #9115599 for sale

ULTRATECH Sapphire 100 is a wafer stepper designed to facilitate the production of integrated circuits. This device uses extreme ultraviolet (EUV) lithography technology to accurately pattern the semiconductive device layers onto a wafer. By using the advanced exposure technology, the users can achieve a patterning precision within ±4 nanometers (nm). The EUV lithography provides a much higher resolution than what is achievable with traditional ultraviolet (UV) lithography techniques. Sapphire 100 is designed for accuracy in production yields. With a pitch down to 22nm; jog and footstep specification of ±2μm, with perfectly aligned edges; and sub-nm image registration, fine line and patterning features can be accurately reproduced. The high precision alignment that the device is capable of enables the production of densely packed integrated circuits. ULTRATECH Sapphire 100 boasts high throughput with a high-resolution exposure combination that is capable of generating 4,000 to 5,000 wafers per hour. This device can also be integrated with other maskless technologies with no additional investment required. Sapphire 100 is capable of producing smaller wafers than most other steppers. This, along with the use of state-of-the-art components, allows users to experience a low cost per wafer. Certain peripheral functions, such as the ability to manually align pattern cadence, are also part of the device. ULTRATECH Sapphire 100 is designed for reliability and consistent performance of the output. It also has the potential to address single component variability, something that is necessary for large integrated circuit production. In addition to its high-precision performance, Sapphire 100 has proved to be an efficient and cost-effective device for chip manufacturers. The machine is designed with user-friendly graphical interfaces that make it easy to use. Furthermore, the device is compatible with all major stepper systems. In summary, ULTRATECH Sapphire 100 is a high-precision wafer stepper designed to enable the production of closely packed integrated circuits. By utilizing state-of-the-art components and technologies, the device is capable of producing a fine patterning accuracy of ±4 nm, a high throughput of 4,000 to 5,000 wafers per hour, and an efficient and cost-effective performance. The user-friendly graphical interfaces and backward compatibility with other maskless systems make Sapphire 100 a versatile and cost-effective choice for chip manufacturers.