Used ULTRATECH Sapphire 100E #293664300 for sale

ULTRATECH Sapphire 100E Wafer Stepper is designed to enable single wafer processing from the earliest stages of semiconductor fabrication. This step-and-repeat equipment features a state-of-the-art camera system combined with a column-managed design for smooth and successful alignment of wafers. Sapphire 100E also includes a suite of precision components, with a measuring accuracy of +/−2mm, and a maximum wafer dimension of 25mm×300mm. The advanced interferometric optical unit within ULTRATECH Sapphire 100E offers fast alignment with nanometer positioning accuracy, as well as an advanced operating environment for specialty optical tasks with a high degree of repeatability. The usage of 6-axis correction coupled with an innovative optical machine ensures accurate alignment every time, greatly reducing overhead costs and production times. Sapphire 100E also offers high-accuracy measurement capabilities, including resolution down to the nanometer level. ULTRATECH Sapphire 100E Wafer Stepper features a robust and powerful laser autofocus tool, allowing for easy utilization of every feature of the stepper throughout each step of wafer processing. The focus range of the laser autofocus asset is adjustable according to the individual application-from a full field of view of 500mm to a reference field of 2mm. This flexibility grants the stepper immense diversity in its potential uses, making it an extremely versatile model for a variety of tasks. The optical equipment of Sapphire 100E Wafer Stepper consists of a combination of advanced imaging sensors and fiber optics from leading manufacturers, providing precise control for each component of the exposure and imaging sequence. An extensive range of interchangeable filters ensures adaptability and extends the possibilities of the stepper throughout each stage of the wafer production process. Furthermore, ULTRATECH Sapphire 100E's automated exposure control system allows users to define variables such as energy levels and exposures times, ensuring accuracy and consistent high-quality results. Sapphire 100E features an intuitive interface with an easy-to-use graphic-based control unit, designed to allow for easy loading and operation without a learning curve. In addition, the ASIC-based pattern recognition machine within the stepper offers digitizing and programming capabilities, allowing for complex pattern exposure with automated optimization. ULTRATECH Sapphire 100E Wafer Stepper is an essential tool in the modern semiconductor fabrication process, providing repeatable accuracy and flexibility. With its advanced optical design, precise laser autofocus tool, superior imaging capabilities, and intuitive control asset, Sapphire 100E is a powerful and versatile tool for wafer processing.