Used ULTRATECH Saturn Spectrum 3 #9293521 for sale

ULTRATECH Saturn Spectrum 3
ID: 9293521
Vintage: 2000
Steppers 2000 vintage.
ULTRATECH Saturn Spectrum 3 wafer stepper is a semi-automated tool designed for the accurate and efficient alignment and exposure of semiconductors during the production process. This tool features a 9"x9" x-y stage, two 8" round-robin stages, and a 600mm depth-of-field. It utilizes a computer-controlled, digital pattern generator (PG) that provides sub-micron resolution and provides repeat accuracy for high throughput. Saturn Spectrum 3 wafer stepper is built on a robust frame that provides considerable stability as the tool processes wafers. Its two 8" round-robin stages afford accurate alignment and positioning of the wafer during exposure, allowing for double-side processing, multi-level patterning, and high throughput. Additionally, all three axes of the tool can work together to facilitate the most advanced operations for semiconductor processing. Part of the PG-driven software suite included with the tool is an autoalign function that assists during setup and fine-tuning of the wafer. This function not only increases throughput, it helps ensure optimal alignment as the wafer is brought into position for each layer of exposure. The 2000-line/mm optical system offers clear images of patterns by eliminating the geometrical distortion and flare of light that may occur at higher NA levels. In combination with a focused ion beam coater, ULTRATECH Saturn Spectrum 3 wafer stepper offers a fully automated system that does away with manual processes. Its low thermal drift ensures temperature-compensated accuracy, while its low maintenance costs make it an ideal tool for a variety of processes and substrates. Additionally, its computer-controlled software ensures accuracy and repeatable output, allowing for flexibility and good results even under extensive production cycles. Saturn Spectrum 3 wafer stepper offers advanced, automated semiconductor processing with accuracy and precision. Its computer-controlled precision, x-y capabilities, and double-side processing make it a powerful tool in the production of the most advanced substrates.
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