Used ULTRATECH Saturn Spectrum 300 #9198660 for sale
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ID: 9198660
Vintage: 2005
Stepper
Mainframe configurations:
Controller unit:
Centralized control and distributed control
SECS Compatibility
Exposure unit:
Hg Lamp
GHI-Line light source
Indexer unit:
Two cassette loader / Unloader
Universal wafer size
Transfer unit:
Robot
Can handle 6", 8" and 12" wafers, both notch and flat type
Wafer stage unit:
Linear motor XY stage
Reticle stage
Automated wafer thickness compensator
Alignment unit:
Pre-alignment: Automatic enhanced global alignment
Through the lens alignment
MVS (Machine vision system) pattern recognition system
Closed loop dose control system
Focus detector and focus leveling system
Operation unit:
Alignment monitor
Program execution monitor
Keyboard or joy-stick
Printer
Safety unit:
Vibration isolation system
Auto alarm system
Interlock protection system
Hardware specification:
Notch and flat wafer
SEMI and JEIDA standard
Wafer thickness: 11-30 mil
Stage type:
Linear motor drive
3-Axes of freedom
Wafer handling:
Cassette to cassette
Conform to SEMI and JEDIA standard
Hg Lamp type: 1000 Watt
Reticle size: 6 x 6 x 0.25 inch
Reticle library: (12) Slots library with barcode reader
Fields per reticle:
1-4
6 x 6" -2- field, max field size: 44.0 x 26 mm
6 x 6" -3- field, max field size: 37.6 x 26 mm
6 x 6" -4- field, max field size: 27.6 x 26 mm
Maximum field size: 44 x 22 mm
Global alignment: Within ± 40 µm placement accuracy
Enhanced global alignment: 500 nm, 3δ (Reticle image recognition alignment system)
Alignment optical system: Bright field alignment
Up-time: ≥90%
MTTR: <4 Hours
Reliability test: Cycling test: > 500 wafers (with alignment) processed without reject and fail
Wafer breakage: ≤ 1/ 10000
Vibration control: Active air isolation
Computer / Printer type:
VME Bus controller
CPU: ≥35 MHz
Color graphic monitor
Enclosed impact printer
Process specification:
Minimum feature size: ≤1.40µm
DOF (Depth of focus):
≥ 4 µm (at 2 µm L/S with 2 µm thickness of resist)
≥ 8 µm (at 30/10 µm L/S with 23 µm thickness of resist)
≥10 µm (at 50 µm L/S with 120 µm thickness of drvr film)
Dynamic focus: Provides capability of exposing photosensitive films from 1- 125µm
CD Uniformity: ≤±10%
Irradiance at wafer plane: ≥1200mW/Cm²
Maximum image area: 44 X 26 mm²
Exposure spectrum: 350 - 450nm (GHI-line/ Full spectrum)
Exposure uniformity: ≤ ±4%
Alignment accuracy: ≤ 0.5 µm (3δ)
Throughput: 8-inch wafer, 400mj/ Cm², 44 x 22 mm field size, wafer layout 26 steps: >60 wph
Exposure linearity:≤ ±1%
2005 vintage.
ULTRATECH Saturn Spectrum 300 is a high-performance wafer stepper designed to support all imaging requirements for lithography applications. With its state-of-the-art design, Saturn Spectrum 300 wafer stepper provides precise alignment, reproducible exposure, and repeatable imaging over the entire wafer. The stepper features an advanced optical equipment with a wide field of view (FOV), ensuring maximum resolution across the surface of the wafer. The FOV can be extended up to 300 mm and the total depth of focus (DOF) achieved is less than 2.5 microns. The digitized, high-speed CCD camera and sophisticated pattern recognition algorithms used in the system ensure high-precision alignment and precise exposure. The adjustable baseplate of ULTRATECH Saturn Spectrum 300 provides fine motion resolution and precise alignment of the wafers. The baseplate can be adjusted for sectional registration of up to four areas, allowing for the exposure of irregular systems. The stepper's motion profile can be adjusted to optimize throughput and reduce cycle time. Saturn Spectrum 300 features an array of advanced imaging tools including a complex mask pattern recognition function, negative image strips transformation tool, and advanced auto focus unit. The advanced mask pattern recognition function identifies and locates the objects during imprinting. The negative image strips transformation tool supports changes in the direction of a pattern during imprinting. The advanced auto focus machine ensures proper focus adjustments are made while imaging. In addition, ULTRATECH Saturn Spectrum 300 is equipped with a 3-axis motorized stage, offering nine degrees of freedom, to provide superior accuracy in movement. The 3-axis motorized stage supports pattern matching within a given structure utilizing a variety of steps, while the integrated rotary shutter between exposures produces an extremely uniform exposure field. This wafer stepper is compatible with the recommended radiation sources such as the ArF laser and I-line for accurate imprinting. Saturn Spectrum 300 wafer stepper has built-in safety features for radiation dose measurement to protect users from exposure. Overall, ULTRATECH Saturn Spectrum 300 is a versatile and precise wafer stepper, providing superior resolution, repeatability, and accuracy in lithography applications
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