Used ULTRATECH Saturn Spectrum 300 #9357231 for sale

ULTRATECH Saturn Spectrum 300 is a high-performance wafer stepper specifically designed for mass production of advanced semiconductor devices. The machine achieves excellent yields and throughput performance in semiconductor processing, with a working area of 30 x 30 cm. It is a hybrid built-in projection stepper featuring a large-area size lens equipment and a fully automated scanning capability, making it suitable for sub-micron lithography applications. The system is equipped with two independent photon imaging systems, allowing it to handle stereo lithography without the need for a photomask adapter. It is capable of handling both positive and negative photoresists, making it ideal for resist processing. In addition, the unique 'edge-plunge' feature allows for the precise positioning of contacts on the wafer. Saturn Spectrum 300 utilizes an advanced nine-axis motion control unit to achieve accurate repeatability and stability during semiconductor exposure. It is designed to be highly stable and reliable, and is capable of losing less than 5 percent of its total scan area during operation. The machine is designed with fewer moving parts than traditional wafer steppers, resulting in increased efficiency and reduced maintenance costs. It is built with an all-glass main optics path, ensuring high performance and an ultra-low distortion rate. In addition, it uses an air-water mist for cooling, ensuring uniform coolness without affecting the optical path. This helps in improving image and throughput performance. ULTRATECH Saturn Spectrum 300 is controlled by a powerful yet user-friendly software package, providing the users with ease of operation and flexibility for various semiconductor processing requirements. It also offers advanced data management features, such as auto-correction of errors and a full scan recall machine. Saturn Spectrum 300 is an ideal tool for leading-edge semiconductor processing. It offers superior yields and throughput with minimal disruption caused by size or material changes, and is highly reliable and cost-effective. It is designed to meet the highest standards of precision and accuracy, and offers the latest performance levels for the production of today's most advanced semiconductor devices.