Used ULTRATECH Saturn Spectrum 3e #9232658 for sale

ULTRATECH Saturn Spectrum 3e (Spectrum 3e) is an advanced wafer stepper designed to provide high-accuracy substrate exposure for microelectronics fabrication. Featuring ULTRATECH patent-pending single-reflection metrology equipment, it leverages the latest technology to provide precise, repeatable results for any size substrate. The advanced optics of the Spectrum 3e are designed to deliver accurate overlay for trenching, isolation, lithography, dielectric etching and more. It features a non-contact, low-noise, low-maintenance AutoFocus system that quickly adjusts to substrate height variations. The advanced high-resolution imaging and inspection unit aids in defect prevention while providing sub-2 micron resolution across the entire field. Additionally, an upgraded exposure machine provides a flexible range of wafer and process exposure requirements. The device utilizes a state-of-the-art stage positioning tool for precision robotics, ensuring consistent accuracy at all focus levels. Its advanced multi-point calibration alignment verifies and records the position of every substrate. The Spectrum 3e also features a custom-designed laser source, utilizing dye lasers and semiconductor lasers for enhanced imaging and etching capabilities. The Spectrum 3e includes a full software package for enhanced process control, including programming options to customize recipes for each exposure. The device is also equipped with an internal predictor for exposure time and doser accuracy. Additionally, an industry-leading online monitoring asset provides operators with real-time feedback on device performance. In terms of safety, the Spectrum 3e is UL/ENL-rated for safety, and features a motion stat tracking model to detect any equipment anomalies. Additionally, the device incorporates the latest in diagnostic capabilities to help ensure optimal safety while reducing downtime. Comprehensive and precise, ULTRATECH Spectrum 3e wafer stepper is an ideal choice for any microelectronics facility looking to maximize substrate accuracy and process compatibly. Its advanced optics and imaging system deliver unbeatable accuracy and process efficiency, while its comprehensive safety features ensure process reliability.