Used ULTRATECH SSP 300E2 #9135164 for sale

Manufacturer
ULTRATECH
Model
SSP 300E2
ID: 9135164
Wafer Size: 12"
Vintage: 2004
GHI Broadband illumination stepper, 12" (3) Load ports Reticle (2) Wafers Transfer robot Pre-aligner Wafer edge exclusion arm XY-Stage, 12" Illumination Electronic rack Transformer Optic: Mirror, cold, GHI Reflector, ellipsoidal Lens: PLCX, SI02, 48FL, 22TH, 36DIA Mirror, detector, with holes, WFLD Filter, UV blocking, GHI UV Type: GHI Line / 436 nm Illumination: Mercury arc lamp, 1200 W Field size: 44 mm x 25.7 mm Reticle size: 152 mm x 152 mm x 6.35 mm Stage: Focus: Air probe type WEM: Ring type Laser: He-Ne laser, 633 nm 2004 vintage.
ULTRATECH SSP 300E2 is a high precision wafer stepper designed for semiconductor lithography. It is an innovative equipment, combining cutting-edge lithography technology with advanced automation features that provide exceptionally reliable operation. SSP 300E2 features a versatile high-performance wafer alignment system and state-of-the-art motion control technology, providing for fast, accurate and repeatable positioning of wafers onto the stepper chuck. With an integral auto-filler, wafer indexing is completed automatically, eliminating manual operations and the potential for mistakes. ULTRATECH SSP 300E2 wafer stepper offers a wide range of advanced imaging capabilities, including optimized 5x exposure and advanced multi-patterning. The unit is equipped with a large working area, enabling full exposure of large 14 inch wafers. SSP 300E2 is structured to support a range of printing modes, including partially-exposed multiple printing, conformal printing, shift-exposure printing, and stepped exposure. Stepping accuracy of 3mm can be achieved by employing auto alignment and dose shading functions. Designed with enhanced automation features, ULTRATECH SSP 300E2 offers a completely automated machine with zero manual intervention. The tool includes a Robot Handler with a Wafer Tray Loader, which can accurately load up to ten wafers into the chuck automatically. It also has an integrated job program generator, designed to enable users to quickly and easily set up multiple ingredient doses and overlays. SSP 300E2 provides excellent imaging performance, with a minimum line width of 90nm and advanced resolution into the sub-micron range. It is efficient and energy saving, to reduce operating costs over time. To ensure consistent and reliable operation, the asset is designed with built-in hardware and software diagnostics - monitoring and reporting machine parameters to maintain optimum performance. ULTRATECH SSP 300E2 wafer stepper is the ideal tool for advanced lithography applications, providing reliable operation, accurate stepper positioning and fast, precise, and repeatable imaging performance. It is one of the most technologically advanced systems on the market - perfect for cost-efficient and efficient production environments.
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