Used ULTRATECH Star 100 #9252513 for sale

ULTRATECH Star 100 wafer stepper is an advanced lithographic tool used for patterning both large and small structures on a semiconductor wafer. It is a top-of-the-line stepper, capable of producing high resolution, high precision images while maintaining a highly accurate focus and alignment across the entire wafer. ULTRATECH STAR100 employs an advanced mode of optical illumination called KrF immersion lithography. This technique employs a deep UV illumination source and a chemical reaction between the wafer and the illuminated area which results in high resolution due to the greater depth of focus and small spot size of the KrF source. Star 100's state-of-the-art dual-axis projection optics allow for extremely fine adjustments when imaging features with tight tolerance requirements. In addition, the projection optics provide a high numerical aperture which, along with the sub-micron resolution of the imaging equipment, ensure that the lithographic patterns projected are of the highest quality. The ultra-precise stage of STAR100 further enhances its imaging capability. This stage combines a high resolution motion control system and a finely tuned indexing drive for best-in-class alignment accuracy. The stage has both x- and y-axis control to achieve a positioning accuracy of 0.5 micron. For substrate control, ULTRATECH Star 100 employs a microcrystalline diamond chuck unit. This machine eliminates edge effects and ensures uniform temperature distribution across the wafer for optimal pattern transfer. ULTRATECH STAR100's source/exposure controls are designed for superior repeatability and reliability. It has a range of adjustable Tool 6 parameters, from laser power to shutter speed, which allow for intricate fine-tuning of the exposure process. Finally, Star 100 is equipped with a sophisticated fault detection and correction asset that can detect potential problems before they cause errors in the fabrication process. This model continuously scans the wafers and monitors the parameters for any discrepancies and, should any exist, can activate alarms or automatically adjust the process parameters.