Used ULTRATECH Titan II #9207808 for sale

Manufacturer
ULTRATECH
Model
Titan II
ID: 9207808
Wafer Size: 4"-8"
Wafer stepper, 4"-8" Reticle size: 5 x 5" Reticle library: 12-Slots / Bar code reader Projection ratio 1:1 Lens resolution: 2 um Field size: 44 mm x 22 mm Wavelength: GH Substrate size: 2"-6" Wafer handling: Cassette to cassette / Interface (12) Reticle storages with bar code reader Stage: Monolithic structure Linear motor drive PC: VME Bus controller CPU 68030 Graphics monitor Vibration control: Active air isolation Alignment: Global: 120 nm, 3seconds Site by site: < 120 nm, 3seconds Alignment spectrum: 500-650 nm (2) Targets per field required Imaging and lens: Feature size: 2.0 micron Lens distortion: 120 nm Colinearity: 80 nm Maximum image area: 55 mm x 18 mm Exposure spectrum: Broadband: 390 nm - 450 nm Wafer plane intensity: > 1200 mW/cm² Uniformity: 2.0% Reticle: Substrate type: 6" x 6" x 0.25" / 5" x 5" x 0.09" quartz Field / Row: 2-5 Pellicle standoff: 2.0 mm Square, 4.5": >83 WPH (100 mJ / cm²) 65 WPH (800 mJ / cm²) Round, 6": >75 wph (100 mJ / cm²) 55 wph (800 mJ / cm²) Field change time: <10 seconds Reticle change time: <120 seconds Alignment target: Compatible with 200 mm scribe DOF: 6 um Illuminator: 1000 W Uniformity: 3% GENMARK Wafer handler Environmental chamber HP / HEWLETT-PACKARD 362 Computer running HPL CE Marked.
ULTRATECH Titan II is a fully automated multi-project wafer stepper designed to deliver high-precision, high speed lithography in a range of sizes and formats. Titan II is based on a full range of masks and features a modular design that allows users to tailor their lithography systems to the specific requirements of the application. The equipment has an integrated process chamber that is capable of handling large modules and multi-part components with ease. It offers excellent alignment accuracy and repeatability, with a feature resolution of up to 1.5 micron. ULTRATECH Titan II also has a unique, patented AutoStrobe laser interferometry system for high accuracy wafer/mask/photoresist alignment and placement. Titan II was designed for optimal throughput and ease of use. It includes a self-diagnostics unit for detecting and eliminating common causes of misfeeds and misalignments. The stepper's three-axis staging is capable of carrying the required data disks and photomasks in a repeatable and exact mode. ULTRATECH Titan II is a high-quality, powerful wafer stepper machine. It is able to lithograph components with a feature resolution of up to 1.5 microns, giving an excellent degree of accuracy and repeatability. The AutoStrobe laser interferometry tool ensures accurate alignment and placement of wafers and masks, while the asset's modular design makes it ideal for a variety of applications. Titan II is an excellent choice for a wide range of lithography needs, providing reliable, accurate and repeatable results at a very competitive price.
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