Used ULTRATECH UltraStep 1500 #9266062 for sale

ULTRATECH UltraStep 1500 is a wafer stepper that provides a high level of performance in a wide variety of applications. This equipment is designed to accurately and efficiently pattern a desired photolithography process on a variety of material surfaces, including semiconductor wafers. It features a simple user-friendly interface that allows for quick and easy setup, as well as making it an excellent choice for a wide variety of users. UltraStep 1500 is constructed with a high-resolution quartz projection lens and a highly adaptive, programmable stage for improved accuracy and repeatability. It has an advanced optical system that produces clear, precise images with a minimum of aberration and image deterioration. This unit also has an integrated laser machine for alignment of wafers and masks. ULTRATECH UltraStep 1500 has a variety of advanced features that make it an ideal choice for patterning processes with an increased level of detail and complexity. This tool utilizes advanced X/Y scanning techniques to achieve full field exposure accuracy for a wide variety of feature sizes. It also has a high throughput design that provides the ability to pattern larger areas quickly and efficiently. UltraStep 1500 also incorporates a wide range of integrated control features. This asset has fully programmable exposure settings so that precise parameters can be stored and applied for different projects quickly and easily. It also supports a range of exposure types, including single- and multi-layer exposure, variable power/time exposures, spot exposure, and variable line width exposure. ULTRATECH UltraStep 1500 is an ideal choice for precision patterning processes due to its high accuracy and repeatability. It is designed to meet the demands of a wide variety of patterning needs, and its integrated control features and user-friendly interface make it an outstanding choice for wafer-level packaging operations. This model is a great choice for both production and laboratory applications and provides an excellent platform for research and development of photolithography processes.