Used ULTRATECH XLS 200 #9382961 for sale

ULTRATECH XLS 200 Wafer Stepper is an advanced lithography equipment specifically designed for the fabrication of sub-micron semiconductor wafers. This system boasts the latest in advanced imaging and exposure technologies, offering users the highest levels of accuracy and cost control. ULTRATECH XLS200 utilizes a retractable integrated optical platform with a dual stepper motor drive unit that provides accuracy up to one entire nanometer. The platform features a full-field scanning stage, an integrated pattern generator, and an automated exposure machine. The integrated pattern generator has a repeat accuracy of 10nm and can achieve highly precise resolutions of 0.5 μm. XLS 200 comes equipped with an advanced exposure tool, with the integrated scanning stage capable of scanning up to 200mm wafers at a speed of 6 s/scan. The exposure asset features multiple algorithms, including optimized runtime power compensation, monolithic alignment, and dose-shaping, allowing users to maximize throughput and minimize power consumption. XLS200 further features a fully-automated wafer track management model. This feature allows for inputs to be loaded faster and with fewer manual adjustments to ensure the highest throughput and accuracy. The wafer track management equipment also provides a comprehensive system history that allows users to track errors, trace errors, and optimize operations to quickly and efficiently complete tasks. ULTRATECH XLS 200 is ULTRATECH most powerful and advanced lithography unit, and is designed to meet both the highest levels of accuracy and cost control demanded by the semiconductor industry. With its integrated optical platform, higher resolution capability, and automated exposure and wafer track management systems, ULTRATECH XLS200 is the machine of choice for critical fabrication and development cycles.