Used ASML Overlay measurement system #293672253 for sale

ASML Overlay measurement equipment is a wafer testing and metrology system used in the semiconductor industry. It combines mechanical, optical, and optical/mechanical metrology capabilities to measure the position and/or overlay of critical features on semiconductor wafers. The unit is capable of taking extremely precise measurements of the alignment between different features on a wafer, or between different wafers. The machine utilizes a high-precision scan stage with high resolution encoders to accurately position the wafer to allow the measurement of patterns at a wide variety of angles. The measurement head, used to acquire wafer data, consists of a laser, quadrant detector, and filter wheel assembly. A high-resolution motorized wafer handler aids in the alignment and testing of multiple wafers. Overlay measurement tool is completely automated and can handle production volumes. Utilizing specialized robotic wafer handling tools, the asset is capable of handling multiple wafers in a single cycle, and can measure thousands of points per wafer. The measurement model is also designed to be highly reliable, with minimal downtime due to periodic maintenance and dedicated software solutions. Data acquisitions of ASML Overlay measurement equipment is done by means of off-axis backscatter Moiré or OASM. This technique is used to measure overlay and alignment between two layers of patterns. OASM uses a laser shone through a beam splitter to divide the light into two paths. One beam is deflected through a grating that rotates in order to measure the alignment of the two layers. The second beam is scanned across the pattern to provide topographical data. This data is then used to calculate the results. The measured wafer data is presented in several formats, using various kinds of visualizations. The data allow the user to quickly compare measurements such as overlay, misalignment, and critical dimension. It also enables the analysis of CD results, providing valuable recommendations on actions to improve yield. Overlay measurement system is an excellent choice for semiconductor production, bringing flexibility, accuracy, and reliability to wafer testing and metrology. It offers a wide range of measurement capabilities, as well as advanced data analysis tools, all in a cost-effective package.